Hada Senka Perfect Gel

Shiseido

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Product Ingredient Safety Breakdown (EWG Rating Ratings)

  • Low Risk
  • Moderate Risk
  • High Risk
  • Unknown
88%
6%
6%
0%

CIR Findings Breakdown

  • A - Safe as Used
  • B - Safe with Qualifications
  • C - Unsafe
  • Unknown
44%
13%
6%
38%
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing,Foaming,Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Sodium Citrate
(Ph Adjuster,Buffering Agent,Chelating,Masking)
1
Sorbitol
(Flavoring Agent,Fragrance,Humectant,Plasticizer,Skin Conditioning)
1
Sucrose Stearate
(Skin Conditioning,Emollient,Emulsifying,Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Algin
(Binding Agent,Fragrance,Viscosity Increasing Agent,Binding,Masking,Viscosity Controlling)
Bad for Sensitive Skin
Bad for Sensitive Skin
Bad for Oily Skin
Bad for Oily Skin
1
Water
(Solvent)
2
A
Glycerin
(Denaturant,Fragrance,Hair Conditioning,Humectant,Skin Protecting,Viscosity Decreasing Agent,Perfuming,Solvent)
Good for Dry Skin
Good for Dry Skin
1
A
Triheptanoin
(Viscosity Increasing Agent,Skin Conditioning,Surfactant,Viscosity Controlling)
1
B
Pentaerythrityl Rosinate
(Skin Conditioning,Emollient,Viscosity Increasing Agent,Film Forming)
1
Phytosteryl/Octyldodecyl Lauroyl Glutamate
(Skin Conditioning)
2
A
Citric Acid
(Chelating Agent,Fragrance,Ph Adjuster,Buffering Agent,Masking)
Anti-Aging
Anti-Aging
Bad for Sensitive Skin
Bad for Sensitive Skin
3
A
Dimethicone Copolyol
Silicone
Silicone
3
B
PEG-60 Hydrogenated Castor Oil
(Fragrance,Sufactant,Surfactant)
Fungal Acne
Fungal Acne Trigger
5
A
Poloxamer 184
(Emulsifying,Surfactant)
8
Fragrance
(Deodorant,Masking,Perfuming)
1
3
Mineral Oil
(Fragrance,Hair Conditioning,Skin Conditioning,Emollient,Skin Protecting,Solvent,Antistatic Agent,Perfuming)
comedogenic2
Comedogenic Rating (2)