Makeup Melt Cleanser
The Bliss Makeup Melt Cleanser is a makeup remover. Our analysis of its 35 ingredients (26 low-risk) rates it Excellent (97/100).
Product Ingredient Safety Breakdown (EWG Rating Ratings)
CIR Findings Breakdown
| EWG | CIR | Ingredient Name & Cosmetic Functions | Notes |
|---|---|---|---|
1
|
|
Water
(Solvent) |
|
|
2
|
A
|
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent) |
Good for Dry Skin
Fungal Acne Trigger
|
|
1
|
|
Caprylyl/Capryl Glucoside
(Cleansing, Foaming, Surfactant) |
|
|
1
|
|
Hydroxyethyl Acrylate/Sodium Acryloyldimethyl Taurate Copolymer
(Emulsion Stabilising, Viscosity Controlling) |
|
|
1
|
A
|
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning) |
Good for Dry Skin
|
|
|
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning) |
|
|
|
|
CHAMOMILLA RECUTITA FLOWER EXTRACT
(Fragrance, Skin Conditioning) |
|
|
1
|
|
Rosa Centifolia Flower Extract
(Astringent, Masking, Skin Conditioning, Tonic) |
|
|
|
|
lavandula angustifolia oil
(Fragrance, Tonic) |
|
|
|
|
Helianthus Annuus Seed Oil
(Fragrance, Skin Conditioning, Skin Conditioning Emollient) |
|
|
|
|
Glycine Soja Oil
(Perfuming, Skin Conditioning, Skin Conditioning Emollient) |
|
|
1
|
A
|
Allantoin
(Skin Conditioning, Skin Protecting, Soothing) |
Good for Oily Skin
Good for Sensitive Skin
|
|
1
|
B
|
Sodium Cocoyl Apple Amino Acids
(Hair Conditioning, Skin Conditioning, Surfactant Foambooster, Foam Boosting) |
|
|
1
|
B
|
Sodium Lauroyl Oat Amino Acids
(Hair Conditioning, Skin Conditioning, Surfactant Cleansingagent, Antistatic Agent) |
|
|
|
|
Shea Butter Ethyl Esters
(Skin Conditioning, Skin Conditioning Emollient) |
|
|
1
|
|
Xylitylglucoside
(Humectant, Skin Conditioning) |
|
|
1
|
|
Anhydroxylitol
(Humectant, Skin Conditioning) |
|
|
1
|
|
Xylitol
(Flavoring Agent, Humectant, Skin Conditioning) |
|
|
1
|
|
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling) |
|
|
3
|
A
|
Acacia Senegal Gum
(Adhesive, Fragrance, Film Forming, Masking) |
|
|
1
|
A
|
Xanthan Gum
(Binding Agent, Emulsion Stabilising, Skin Conditioning, Surfactant Emulsifying Agent, Viscosity Increasing Agent, Binding, Gel Forming, Viscosity Controlling) |
|
|
|
|
Shea Butteramidopropyl Betaine
(Cleansing, Foam Boosting, Surfactant) |
|
|
1
|
|
Sodium Phytate
(Chelating Agent, Oral Care Agent) |
|
|
1
|
A
|
Hexylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Emulsifying, Perfuming, Skin Conditioning, Surfactant) |
|
|
1
|
A
|
Caprylic/Capric Triglyceride
(Emollient, Masking, Perfuming, Skin Conditioning, Solvent) |
|
|
1
|
A
|
Sorbitan Isostearate
(Emulsifying, Surfactant) |
|
|
3
|
B
|
Polysorbate 60
(Emulsifying, Surfactant) |
Fungal Acne Trigger
|
|
1
|
B
|
Isohexadecane
(Skin Conditioning, Emollient, Solvent) |
|
|
2
|
A
|
Tetrasodium EDTA
(Chelating Agent) |
|
4
|
A
|
Phenoxyethanol
(Fragrance, Preservative) |
Paraben
|
|
1
|
A
|
Ethylhexylglycerin
(Deodorant, Skin Conditioning) |
|
|
3
|
A
|
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking) |
Bad for Sensitive Skin
|
|
1
|
A
|
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking) |
|
|
2
|
A
|
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking) |
Bad for Sensitive Skin
|
|
5
|
|
Linalool
(Fragrance, Deodorant, Masking) |
Allergens
|
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