Mega Slip Pre-Shampoo Detangler
The Hask Mega Slip Pre-Shampoo Detangler is a misc. Our analysis of its 21 ingredients (15 low-risk) rates it Excellent (89/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.
Product Ingredient Safety Breakdown (EWG Rating Ratings)
CIR Findings Breakdown
| EWG | CIR | Ingredient Name & Cosmetic Functions | Notes |
|---|---|---|---|
1
|
|
Water
(Solvent) |
|
|
1
|
A
|
Cetyl Alcohol
(Emulsion Stabilising, Fragrance, Opacifying, Emulsifying, Surfactant, Foam Boosting, Viscosity Increasing Agent, Emollient, Masking, Viscosity Controlling) |
|
|
3
|
B
|
Behentrimonium Chloride
(Antistatic Agent, Hair Conditioning, Preservative) |
|
|
2
|
A
|
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent) |
Good for Dry Skin
Fungal Acne Trigger
|
|
1
|
A
|
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling) |
|
|
1
3
|
|
Aloe Barbadensis Leaf Juice Powder
(Skin Conditioning) |
Good for Sensitive Skin
|
|
1
|
A
|
Squalane
(Emollient, Hair Conditioning, Refatting, Skin Conditioning) |
|
|
|
cocos nucifera oil
(Fragrance, Hair Conditioning, Perfuming, Skin Conditioning) |
|
|
1
|
A
|
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning) |
Good for Dry Skin
|
|
1
|
A
|
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing) |
|
|
3
|
B
|
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative) |
|
|
1
|
A
|
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling) |
|
|
1
|
B
|
Isopropyl Palmitate
(Binding Agent, Fragrance, Skin Conditioning, Emollient, Antistatic Agent, Binding, Perfuming, Solvent) |
Bad for Oily Skin
Fungal Acne Trigger
|
|
2
|
A
|
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking) |
Bad for Sensitive Skin
|
|
1
|
A
|
Ethylhexylglycerin
(Deodorant, Skin Conditioning) |
|
4
|
A
|
Phenoxyethanol
(Fragrance, Preservative) |
Paraben
|
|
|
|
PARFUM
(Fragrance, Perfuming) |
|
7
|
|
Geraniol
(Fragrance, Masking, Tonic) |
Allergens
|
|
5
|
|
Hexyl Cinnamal
(Fragrance, Masking) |
Allergens
|
|
5
|
|
Linalool
(Fragrance, Deodorant, Masking) |
Allergens
|
|
1
|
|
Tetramethyl Acetyloctahydronaphthalenes
(Masking, Perfuming, Skin Conditioning) |
