Radically Kind Makeup Remover
The Hickap Radically Kind Makeup Remover is a makeup remover. Our analysis of its 19 ingredients (14 low-risk) rates it Excellent (98/100).
Product Ingredient Safety Breakdown (EWG Rating Ratings)
CIR Findings Breakdown
| EWG | CIR | Ingredient Name & Cosmetic Functions | Notes |
|---|---|---|---|
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C12-15 Alkyl Benzoate
(Skin Conditioning, Emollient, Antimicrobial) |
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Isohexadecane
(Skin Conditioning, Emollient, Solvent) |
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Isopropyl Isostearate
(Binding Agent, Skin Conditioning, Emollient, Binding) |
Bad for Oily Skin
Fungal Acne Trigger
|
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Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning) |
Good for Dry Skin
|
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Polygonum Tinctorium Leaf Extract
(Skin Conditioning) |
|
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Alteromonas Ferment Extract
(Skin Conditioning) |
|
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BRASSICA CAMPESTRIS SEED OIL
(Skin Conditioning) |
|
|
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Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling) |
|
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|
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Allantoin
(Skin Conditioning, Skin Protecting, Soothing) |
Good for Oily Skin
Good for Sensitive Skin
|
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Pantolactone
(Humectant) |
|
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TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning) |
|
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Glycine Soja Oil
(Perfuming, Skin Conditioning, Skin Conditioning Emollient) |
|
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Hexamidine Diisethionate
(Cosmetic Biocide, Antifoaming Agent, Emollient, Preservative, Skin Conditioning) |
|
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Beta-Sitosterol
(Emulsion Stabilising, Masking, Skin Conditioning, Stabilising) |
|
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Squalene
(Hair Conditioning, Skin Conditioning, Emollient, Antistatic Agent, Refatting) |
Fungal Acne Trigger
|
|
|
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Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling) |
Good for Dry Skin
|
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|
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Phenoxyethanol
(Fragrance, Preservative) |
Paraben
|
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Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent) |
|
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Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking) |
Bad for Sensitive Skin
|
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