Confident Curl Leave-In Wavy
The Keune Confident Curl Leave-In Wavy is a misc. Our analysis of its 27 ingredients (21 low-risk) rates it Excellent (97/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.
Product Ingredient Safety Breakdown (EWG Rating Ratings)
CIR Findings Breakdown
| EWG | CIR | Ingredient Name & Cosmetic Functions | Notes |
|---|---|---|---|
1
|
|
Water
(Solvent) |
|
|
1
|
B
|
Hydrogenated Ethylhexyl Olivate
(Emollient, Skin Conditioning) |
|
|
|
Coconut Oil Glycereth-8 Esters
(Cleansing, Surfactant) |
|
|
3
|
B
|
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling) |
Good for Dry Skin
|
4
|
B
|
Polyacrylamide
(Binding Agent, Film Forming, Hair Fixing, Antistatic Agent, Binding) |
|
|
1
|
|
Polyquaternium-4
(Antistatic Agent, Film Forming, Hair Fixing) |
|
|
3
|
B
|
PEG-40 Hydrogenated Castor Oil
(Fragrance, Emulsifying, Surfactant, Perfuming) |
Fungal Acne Trigger
|
|
1
|
B
|
C13-14 Isoparaffin
(Emollient, Solvent) |
|
|
3
|
B
|
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative) |
|
|
2
|
A
|
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent) |
Good for Dry Skin
Fungal Acne Trigger
|
|
1
|
|
Polyquaternium-72
(Antistatic Agent, Film Forming, Hair Fixing) |
|
|
|
|
PARFUM
(Fragrance, Perfuming) |
|
|
1
|
A
|
Polyquaternium-11
(Antistatic Agent, Film Forming, Hair Fixing) |
|
|
3
|
A
|
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking) |
|
|
1
|
A
|
Hydrogenated Olive Oil Unsaponifiables
(Hair Conditioning, Skin Conditioning, Emollient) |
|
|
1
|
A
|
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling) |
|
|
3
|
B
|
Laureth-7
(Emulsifying, Surfactant) |
|
|
2
|
A
|
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking) |
Bad for Sensitive Skin
|
|
4
|
A
|
Phenoxyethanol
(Fragrance, Preservative) |
Paraben
|
|
1
|
A
|
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant) |
|
|
|
|
Acetum
(Antistatic) |
|
|
|
|
Pyrus Malus Fruit Extract
(Skin Conditioning) |
|
|
1
|
|
Saccharomyces/Magnesium Ferment
(Not Reported) |
|
|
2
|
|
Saccharomyces/Iron Ferment
(Skin Conditioning) |
|
|
3
|
|
Saccharomyces/Zinc Ferment
(Skin Conditioning) |
|
|
1
|
|
Saccharomyces/Copper Ferment
(Skin Conditioning) |
|
|
1
|
|
Saccharomyces/Silicon Ferment
(Skin Conditioning) |
