Reihaku Hatomugi The Mist Lotion

KUMANO COSME

Reihaku Hatomugi The Mist Lotion

0.0
from 0 Ratings
Where to buy Possibly in stock
No retailers tracked yet.

Product Ingredient Safety Breakdown (EWG Rating Ratings)

  • Low Risk
  • Moderate Risk
  • High Risk
  • Unknown
76%
12%
6%
6%

CIR Findings Breakdown

  • A - Safe as Used
  • B - Safe with Qualifications
  • C - Unsafe
  • Unknown
76%
18%
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
1
A
Methyl Gluceth-10
(Emulsifying, Humectant, Moisturising)
3
PEG/PPG/Polybutylene Glycol-8/5/3 Glycerin
(Humectant)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
Sh-Barley Seed Extract
(Skin Conditioning)
1
A
Dipotassium Glycyrrhizate
(Flavoring Agent, Skin Conditioning, Humectant)
1
A
Xanthan Gum
(Binding Agent, Emulsion Stabilising, Skin Conditioning, Surfactant Emulsifying Agent, Viscosity Increasing Agent, Binding, Gel Forming, Viscosity Controlling)
2
A
Styrene/Acrylates Copolymer
(Film Forming, Opacifying)
3
B
PEG-60 Hydrogenated Castor Oil
(Fragrance, Sufactant, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
4
A
Methylparaben
(Fragrance, Preservative)
Paraben
Paraben
7
A
Propylparaben
(Fragrance, Preservative, Perfuming)
Paraben
Paraben