Studio Line Spurenlos FX Liquid Gel
The L'Oréal Studio Line Spurenlos FX Liquid Gel is a misc. Our analysis of its 14 ingredients (8 low-risk) rates it Excellent (80/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.
Product Ingredient Safety Breakdown (EWG Rating Ratings)
CIR Findings Breakdown
| EWG | CIR | Ingredient Name & Cosmetic Functions | Notes |
|---|---|---|---|
4
|
|
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling) |
Bad for Dry Skin
Bad for Sensitive Skin
|
1
|
|
Water
(Solvent) |
|
|
1
|
|
Acrylates/t-Butylacrylamide Copolymer
(Binding Agent, Film Forming, Hair Fixing) |
|
|
1
|
A
|
Niacinamide
(Hair Conditioning, Skin Conditioning, Smoothing) |
|
|
3
|
|
PEG/PPG-4/12 Dimethicone
(Emulsifying) |
|
|
3
|
A
|
Aminomethyl Propanol
(Ph Adjuster, Buffering Agent) |
|
|
6
|
|
Limonene
(Deodorant, Perfuming, Solvent) |
Allergens
|
|
1
|
A
|
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning) |
Good for Dry Skin
|
7
|
|
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking) |
Allergens
|
|
5
|
A
|
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking) |
Allergens
|
|
1
|
A
|
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
(Antioxidant) |
|
|
2
|
A
|
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking) |
Bad for Sensitive Skin
|
|
5
|
|
Hexyl Cinnamal
(Fragrance, Masking) |
Allergens
|
|
|
PARFUM
(Fragrance, Perfuming) |
