Deep Moisture Hair Mask
The Monday Haircare Deep Moisture Hair Mask is a emulsion. Our analysis of its 36 ingredients (27 low-risk) rates it Excellent (95/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.
Product Ingredient Safety Breakdown (EWG Rating Ratings)
CIR Findings Breakdown
| EWG | CIR | Ingredient Name & Cosmetic Functions | Notes |
|---|---|---|---|
1
|
|
Water
(Solvent) |
|
|
2
|
A
|
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent) |
Good for Dry Skin
Fungal Acne Trigger
|
|
1
|
A
|
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling) |
|
|
3
|
A
|
Dimethicone
(Antifoaming Agent, Skin Protecting, Emollient, Skin Conditioning) |
Silicone
|
|
1
|
A
|
Dimethiconol
(Antifoaming Agent, Skin Conditioning, Emollient, Moisturising) |
Silicone
|
|
1
|
B
|
Isopropyl Myristate
(Binding Agent, Fragrance, Skin Conditioning, Emollient, Binding, Perfuming, Solvent) |
Bad for Oily Skin
Fungal Acne Trigger
|
|
|
Butyrospermum Parkii Butter
(Skin Conditioning, Viscosity Controlling) |
|
|
|
|
cocos nucifera oil
(Fragrance, Hair Conditioning, Perfuming, Skin Conditioning) |
|
|
1
|
A
|
Argania Spinosa Kernel Oil
(Emollient, Skin Conditioning) |
Fungal Acne Trigger
|
|
|
|
THEOBROMA CACAO SEED BUTTER
(Fragrance, Skin Conditioning, Skin Conditioning Emollient, Skin Protecting) |
|
|
2
|
A
|
Hydrolyzed Keratin
(Hair Conditioning, Nail Conditioning Agent, Skin Conditioning, Antistatic Agent, Film Forming, Humectant) |
|
4
|
A
|
Phenoxyethanol
(Fragrance, Preservative) |
Paraben
|
|
3
|
B
|
Behentrimonium Chloride
(Antistatic Agent, Hair Conditioning, Preservative) |
|
|
1
|
|
Diglycerin
(Humectant, Skin Conditioning, Solvent) |
|
|
1
|
A
|
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling) |
|
|
|
|
PARFUM
(Fragrance, Perfuming) |
|
|
3
|
A
|
PEG-100 Stearate
(Surfactant) |
Fungal Acne Trigger
|
|
1
|
A
|
Glyceryl Stearate
(Emollient, Emulsifying) |
Fungal Acne Trigger
|
|
1
|
A
|
Amodimethicone
(Antistatic Agent, Hair Conditioning) |
Silicone
|
|
2
|
A
|
Chlorphenesin
(Cosmetic Biocide, Antimicrobial, Preservative) |
|
|
2
|
A
|
Isopropyl Alcohol
(Antifoaming Agent, Fragrance, Solvent, Viscosity Decreasing Agent, Perfuming, Viscosity Controlling) |
Bad for Sensitive Skin
|
|
1
|
B
|
Trideceth-10
(Emulsifying, Surfactant) |
|
|
|
|
TEA-Dodecylbenzenesulfonate
(Cleansing, Foaming, Surfactant) |
Sulfate
|
|
3
|
B
|
Laureth-23
(Cleansing, Emulsifying, Surfactant) |
Bad for Oily Skin
|
|
1
|
A
|
Disodium EDTA
(Chelating Agent, Viscosity Controlling) |
|
|
1
|
B
|
Trideceth-3
(Emulsifying, Surfactant) |
|
|
5
|
A
|
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking) |
Allergens
|
|
1
|
A
|
Ethylhexylglycerin
(Deodorant, Skin Conditioning) |
|
|
3
|
B
|
Polysorbate 60
(Emulsifying, Surfactant) |
Fungal Acne Trigger
|
|
1
|
B
|
Disodium Phosphate
(Buffering Agent, Anticorrosive, Fragrance, Ph Adjuster, Masking) |
|
|
2
|
A
|
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking) |
Bad for Sensitive Skin
|
|
1
|
A
|
Acetic Acid
(Fragrance, Ph Adjuster, Buffering Agent, Masking) |
|
|
1
|
B
|
Sodium Phosphate
(Buffering Agent) |
|
|
5
|
|
Hexyl Cinnamal
(Fragrance, Masking) |
Allergens
|
|
5
|
|
Linalool
(Fragrance, Deodorant, Masking) |
Allergens
|
|
1
|
|
Tetramethyl Acetyloctahydronaphthalenes
(Masking, Perfuming, Skin Conditioning) |
