Deep Muk Ultra Soft Leave-In Conditioner
The Muk Deep Muk Ultra Soft Leave-In Conditioner is a misc. Our analysis of its 17 ingredients (7 low-risk) rates it Excellent (81/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.
Product Ingredient Safety Breakdown (EWG Rating Ratings)
CIR Findings Breakdown
| EWG | CIR | Ingredient Name & Cosmetic Functions | Notes |
|---|---|---|---|
1
|
|
Water
(Solvent) |
|
|
1
|
B
|
Sodium PCA
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning) |
Good for Dry Skin
|
|
1
|
|
Cocoglucosides Hydroxypropyltrimonium Chloride
(Cleansing, Emulsifying, Skin Conditioning, Surfactant) |
|
|
|
Hydrolyzed Collagen PG-Propyl Methylsilanediol
(Hair Conditioning, Skin Conditioning) |
|
|
1
|
A
|
Amodimethicone
(Antistatic Agent, Hair Conditioning) |
Silicone
|
|
|
B
|
Steartrimonium Chloride
(Antistatic Agent, Hair Conditioning, Preservative) |
|
|
1
|
A
|
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning) |
Good for Dry Skin
|
|
|
|
PARFUM
(Fragrance, Perfuming) |
|
7
|
A
|
DMDM Hydantoin
(Preservative) |
|
4
|
A
|
Methylparaben
(Fragrance, Preservative) |
Paraben
|
|
1
|
|
Trideceth-12
(Emulsifying, Surfactant) |
|
|
2
|
A
|
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking) |
Bad for Sensitive Skin
|
|
5
|
|
Citronellol
(Fragrance, Masking) |
Allergens
|
|
5
|
|
Hexyl Cinnamal
(Fragrance, Masking) |
Allergens
|
|
6
|
|
Limonene
(Deodorant, Perfuming, Solvent) |
Allergens
|
|
5
|
|
Linalool
(Fragrance, Deodorant, Masking) |
Allergens
|
|
|
|
Amyl Cinnamal
(Perfuming) |
Allergens
|
