Hydrosculpt Moisturizer

One/Size by Patrick Starrr

Where to buy Possibly in stock
No retailers tracked yet.

Product Ingredient Safety Breakdown (EWG Rating Ratings)

  • Low Risk
  • Moderate Risk
  • High Risk
  • Unknown
79%
7%
0%
14%

CIR Findings Breakdown

  • A - Safe as Used
  • B - Safe with Qualifications
  • C - Unsafe
  • Unknown
50%
14%
36%
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Ethylhexyl Palmitate
(Fragrance, Skin Conditioning, Emollient, Perfuming)
Fungal Acne
Fungal Acne Trigger
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
A
Isostearic Acid
(Binding Agent, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Isostearic Acid., Binding, Emulsifying)
Fungal Acne
Fungal Acne Trigger
1
Pelargonium Graveolens Oil
(Masking, Perfuming)
Passiflora Edulis Fruit Extract
(Skin Conditioning)
3
B
Potassium Hydroxide
(Ph Adjuster, Buffering Agent)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Carbomer
(Emulsion Stabilising, Viscosity Increasing Agent, Gel Forming, Viscosity Controlling)
1
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
(Emulsion Stabilising, Film Forming, Viscosity Controlling)
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin