Ekos Murumuru Reconstruction Hair Mask
The Natura Ekos Murumuru Reconstruction Hair Mask is a misc. Our analysis of its 29 ingredients (23 low-risk) rates it Excellent (92/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.
Product Ingredient Safety Breakdown (EWG Rating Ratings)
CIR Findings Breakdown
| EWG | CIR | Ingredient Name & Cosmetic Functions | Notes |
|---|---|---|---|
1
|
|
Water
(Solvent) |
|
|
1
|
A
|
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling) |
|
|
1
|
B
|
Isopropyl Palmitate
(Binding Agent, Fragrance, Skin Conditioning, Emollient, Antistatic Agent, Binding, Perfuming, Solvent) |
Bad for Oily Skin
Fungal Acne Trigger
|
|
1
|
A
|
Astrocaryum Murumuru Seed Butter
(Emollient, Skin Conditioning) |
|
|
1
|
|
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling) |
|
|
1
|
B
|
Isoamyl Laurate
(Fragrance, Skin Conditioning, Emollient) |
|
|
1
|
B
|
Behentrimonium Methosulfate
(Antistatic Agent, Hair Conditioning, Surfactant) |
|
|
2
|
A
|
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent) |
Good for Dry Skin
Fungal Acne Trigger
|
|
1
|
B
|
Stearamidopropyl Dimethylamine
(Antistatic Agent, Emulsifying, Hair Conditioning, Surfactant) |
|
|
1
|
|
Quaternium-87
(Cleansing, Hair Conditioning, Surfactant) |
|
|
|
PARFUM
(Fragrance, Perfuming) |
|
|
3
|
B
|
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative) |
|
|
1
|
|
Sorbitol
(Flavoring Agent, Fragrance, Humectant, Plasticizer, Skin Conditioning) |
|
|
|
|
Propylene Glycol Diheptanoate
(Anticaking, Film Forming, Skin Conditioning, Skin Conditioning Emollient, Solvent, Viscosity Controlling) |
|
|
1
|
|
Hydroxyacetophenone
(Antioxidant) |
|
|
1
|
A
|
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling) |
|
|
2
|
A
|
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking) |
Bad for Sensitive Skin
|
4
|
B
|
Lactic Acid
(Exfoliant, Fragrance, Humectant, Ph Adjuster, Skin Conditioning Agent Humectant, Skin Conditioning, Buffering Agent) |
Bad for Sensitive Skin
|
|
1
|
A
|
Sodium Gluconate
(Chelating Agent, Skin Conditioning) |
|
|
5
|
|
Linalool
(Fragrance, Deodorant, Masking) |
Allergens
|
7
|
|
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking) |
Allergens
|
|
6
|
|
Limonene
(Deodorant, Perfuming, Solvent) |
Allergens
|
|
1
|
A
|
Sodium Acetate
(Buffering Agent, Fragrance, Masking) |
|
|
3
|
B
|
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent) |
|
|
3
|
|
CI 19140
(Colorant, Cosmetic Colorant) |
|
|
2
|
|
CI 15510
(Cosmetic Colorant) |
|
|
1
|
|
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling) |
|
|
1
|
B
|
Sodium Sulfate
(Viscosity Increasing Agent, Bulking Agent, Viscosity Controlling) |
|
|
1
|
A
|
Sodium Carbonate
(Ph Adjuster, Buffering Agent, Bulking Agent) |
