Ekos Murumuru Reconstruction Hair Mask

Natura

Ekos Murumuru Reconstruction Hair Mask

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About this product

The Natura Ekos Murumuru Reconstruction Hair Mask is a misc. Our analysis of its 29 ingredients (23 low-risk) rates it Excellent (92/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
29
Low-risk
23
Fragrance
Contains fragrance
Origin
Brazil

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 7/6
Good for dry skin
Cetearyl Alcohol Sorbitol Astrocaryum Murumuru Seed Butter Isoamyl Laurate Isopropyl Palmitate Glycerin Lactic Acid
Caution for dry skin
Behentrimonium Methosulfate Stearamidopropyl Dimethylamine Glycerin Quaternium-87 Cetrimonium Chloride Sodium Hydroxide
Oily/Acne-Prone Skin No data
Sensitive Skin 2/11
Good for sensitive skin
Glycerin Hydroxyacetophenone
Caution for sensitive skin
Sodium Acetate Sodium Chloride Sorbitol Isoamyl Laurate Isopropyl Palmitate Glycerin Citric Acid Lactic Acid Linalool Limonene Benzyl Salicylate

Ingredients list

29 total
Lower hazard (1) Higher hazard (7)
All29 Skin Conditioning11 Fragrance10 Solvent6 Viscosity Controlling6 Masking5 Buffering Agent5 Humectant5 Emulsion Stabilising4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
1
B
Isopropyl Palmitate
(Binding Agent, Fragrance, Skin Conditioning, Emollient, Antistatic Agent, Binding, Perfuming, Solvent)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
1
A
Astrocaryum Murumuru Seed Butter
(Emollient, Skin Conditioning)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
B
Isoamyl Laurate
(Fragrance, Skin Conditioning, Emollient)
1
B
Behentrimonium Methosulfate
(Antistatic Agent, Hair Conditioning, Surfactant)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Stearamidopropyl Dimethylamine
(Antistatic Agent, Emulsifying, Hair Conditioning, Surfactant)
1
Quaternium-87
(Cleansing, Hair Conditioning, Surfactant)
PARFUM
(Fragrance, Perfuming)
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
1
Sorbitol
(Flavoring Agent, Fragrance, Humectant, Plasticizer, Skin Conditioning)
Propylene Glycol Diheptanoate
(Anticaking, Film Forming, Skin Conditioning, Skin Conditioning Emollient, Solvent, Viscosity Controlling)
1
Hydroxyacetophenone
(Antioxidant)
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
4
B
Lactic Acid
(Exfoliant, Fragrance, Humectant, Ph Adjuster, Skin Conditioning Agent Humectant, Skin Conditioning, Buffering Agent)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Sodium Gluconate
(Chelating Agent, Skin Conditioning)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
1
A
Sodium Acetate
(Buffering Agent, Fragrance, Masking)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
3
CI 19140
(Colorant, Cosmetic Colorant)
2
CI 15510
(Cosmetic Colorant)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
B
Sodium Sulfate
(Viscosity Increasing Agent, Bulking Agent, Viscosity Controlling)
1
A
Sodium Carbonate
(Ph Adjuster, Buffering Agent, Bulking Agent)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cetearyl Alcohol
Emollient
Isopropyl Palmitate
Skin Conditioning, Emollient
Astrocaryum Murumuru Seed Butter
Emollient, Skin Conditioning
Isoamyl Laurate
Skin Conditioning, Emollient
Glycerin
Humectant, Skin Protecting
Sorbitol
Humectant, Skin Conditioning

Benefits

Good for dry skin

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
Benzyl Salicylate — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
Astrocaryum Murumuru Seed Butter
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientSkin conditioning
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Isoamyl Laurate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceSkin conditioningEmollient
Behentrimonium Methosulfate
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSurfactant
Stearamidopropyl Dimethylamine
Antistatic agent, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentEmulsifyingHair conditioningSurfactant
Quaternium-87
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CleansingHair conditioningSurfactant
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Sorbitol
Flavoring agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 Flavoring agentFragranceHumectantPlasticizerSkin conditioning
Propylene Glycol Diheptanoate
Anticaking, Film forming
Limited public safety data.Read moreShow less
EWG N/A AnticakingFilm formingSkin conditioningSkin conditioning emollientSolventViscosity controlling
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Sodium Gluconate
Chelating agent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentSkin conditioning
+ 7 more — see the full ingredients list above
Isopropyl Palmitate
Binding agent, Fragrance
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR B Binding agentFragranceSkin conditioningEmollientAntistatic agentBindingPerfumingSolvent Bad for Oily SkinFungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Lactic Acid
Exfoliant, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 4 CIR B ExfoliantFragranceHumectantPh adjusterSkin-conditioning agent -humectantSkin conditioningBuffering agent Bad for Sensitive Skin
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.
  • 2 Wear SPF the next day: Acids and retinoids increase sun sensitivity — daily sunscreen is a must while using this.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

AHA (acid exfoliant) 5–10% (OTC)

OTC leave-on AHAs are usually 5–10%. The effect also depends on pH and free-acid value, not the percentage alone.

Lactic Acid

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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