Semi Di Lino Moisture Nutritive Leave-In Conditioner

Alfaparf Milano

Semi Di Lino Moisture Nutritive Leave-In Conditioner

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About this product

The Alfaparf Milano Semi Di Lino Moisture Nutritive Leave-In Conditioner is a misc. Our analysis of its 32 ingredients (27 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
32
Low-risk
27
Fragrance
Contains fragrance
Origin
Italy
Data updated
May 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 10/5
Good for dry skin
Glucose Glutamic Acid Cetearyl Alcohol Sucrose Glycerin Fructose Hexyl Nicotinate Dimethicone Dimethicone PEG-8 Meadowfoamate Urea
Caution for dry skin
Dextrin Glycerin Trideceth-10 Hexylene Glycol Cetrimonium Chloride
Oily/Acne-Prone Skin No data
Sensitive Skin 3/10
Good for sensitive skin
Sucrose Glycerin Dimethicone
Caution for sensitive skin
Glutamic Acid Aspartic Acid Alanine Glycerin Hexylene Glycol Citric Acid Isopropyl Alcohol Sodium Benzoate Potassium Sorbate Phenoxyethanol

Ingredients list

32 total
Lower hazard (1) Higher hazard (6)
All32 Skin Conditioning21 Fragrance11 Humectant10 Antistatic Agent9 Hair Conditioning8 Preservative5 Perfuming5 Masking4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
3
A
Dimethicone
(Antifoaming Agent, Skin Protecting, Emollient, Skin Conditioning)
Silicone
Silicone
1
A
Amodimethicone
(Antistatic Agent, Hair Conditioning)
Silicone
Silicone
PARFUM
(Fragrance, Perfuming)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
B
Behentrimonium Chloride
(Antistatic Agent, Hair Conditioning, Preservative)
1
A
Hexylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Emulsifying, Perfuming, Skin Conditioning, Surfactant)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
B
Hydrolyzed Wheat Protein
(Film Forming, Hair Conditioning, Skin Conditioning, Antistatic Agent)
2
A
Isopropyl Alcohol
(Antifoaming Agent, Fragrance, Solvent, Viscosity Decreasing Agent, Perfuming, Viscosity Controlling)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
1
B
Trideceth-10
(Emulsifying, Surfactant)
3
Dimethicone PEG-8 Meadowfoamate
(Hair Conditioning, Skin Conditioning, Emollient)
1
A
Fructose
(Flavoring Agent, Humectant)
1
A
Glucose
(Flavoring Agent, Humectant, Skin Conditioning Agent Miscellaneous)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Dextrin
(Absorbent, Binding Agent, Bulking Agent, Viscosity Increasing Agent, Binding, Viscosity Controlling)
1
A
Sucrose
(Flavoring Agent, Humectant, Skin Conditioning, Soothing)
3
A
Urea
(Buffering Agent, Humectant, Antistatic Agent, Skin Conditioning)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Carnosine
(Skin Conditioning)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
6
Ethylhexyl Methoxycinnamate
(Uv Absorber, Uv Filter)
Bad for Oily Skin
Bad for Oily Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Alanine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Aspartic Acid
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Glutamic Acid
(Fragrance, Hair Conditioning, Humectant, Antistatic Agent)
1
Hexyl Nicotinate
(Skin Conditioning, Antistatic Agent, Emollient)
Linum Usitatissimum Seed Extract
(Perfuming, Skin Conditioning)
1
A
Caesalpinia Spinosa Gum
(Adhesive, Skin Conditioning, Viscosity Increasing Agent, Film Forming, Viscosity Controlling)
3
A
Potassium Sorbate
(Fragrance, Preservative)
A
Biosaccharide Gum-4
(Skin Conditioning)

My Ingredient Notes

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Key ingredients

Urea
Gently exfoliates and deeply moisturizes.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.
Anti-AgingSoftens lines and helps skin look youthful.
Reduces IrritationEases discomfort and supports skin resilience.
Skin TextureSmooths rough patches and refines texture.
Show all 6 benefits

Concerns

Contains paraben
Contains silicone
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Behentrimonium Chloride
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentHair conditioningPreservative
Hexylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentEmulsifyingPerfumingSkin conditioningSurfactant
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Hydrolyzed Wheat Protein
Film forming, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Film formingHair conditioningSkin conditioningAntistatic agent
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Trideceth-10
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Dimethicone PEG-8 Meadowfoamate
Hair conditioning, Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 Hair conditioningSkin conditioningEmollient
Fructose
Flavoring agent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Flavoring agentHumectant
Glucose
Flavoring agent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Flavoring agentHumectantSkin-conditioning agent- miscellaneous
Dextrin
Absorbent, Binding agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AbsorbentBinding agentBulking agentViscosity increasing agentBindingViscosity controlling
Sucrose
Flavoring agent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Flavoring agentHumectantSkin conditioningSoothing
Urea
Buffering agent, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Buffering agentHumectantAntistatic agentSkin conditioning
+ 10 more — see the full ingredients list above
Dimethicone
Antifoaming agent, Skin protecting
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antifoaming agentSkin protectingEmollientSkin conditioning Silicone
Amodimethicone
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning Silicone
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Isopropyl Alcohol
Antifoaming agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antifoaming agentFragranceSolventViscosity decreasing agentPerfumingViscosity controlling Bad for Sensitive Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Ethylhexyl Methoxycinnamate
Uv absorber, Uv filter
Potentially a skin irritantRead moreShow less
EWG 6 Uv absorberUv filter Bad for Oily SkinBad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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