Aveeno Stress Relief Foaming Bath

Aveeno

Aveeno Stress Relief Foaming Bath

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About this product

The Aveeno Stress Relief Foaming Bath is a misc. Our analysis of its 19 ingredients (14 low-risk) rates it Excellent (82/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
19
Low-risk
14
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/10
Good for dry skin
Glyceryl Oleate Di-PPG-2 Myreth-10 Adipate Glycerin
Caution for dry skin
Glyceryl Oleate Di-PPG-2 Myreth-10 Adipate Glycerin Coco-glucoside Avena Sativa (Oat) Kernel Flour Acrylates Copolymer Sodium Laureth Sulfate Sodium Hydroxide Polysorbate 20 PEG-80 Sorbitan Laurate
Oily/Acne-Prone Skin No data
Sensitive Skin 1/5
Good for sensitive skin
Glycerin
Caution for sensitive skin
Glyceryl Oleate Glycerin PEG-80 Sorbitan Laurate Quaternium-15 Fragrance

Ingredients list

19 total
Lower hazard (1) Higher hazard (8)
All19 Surfactant6 Antistatic Agent4 Skin Conditioning4 Emulsifying4 Film Forming4 Hair Conditioning3 Viscosity Increasing Agent3 Perfuming3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
3
Sodium Laureth Sulfate
(Cleansing, Emulsifying, Foaming, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
Sulfate
Sulfate
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
5
B
PEG-80 Sorbitan Laurate
(Fragrance, Sufactant, Surfactant, Emulsifying)
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
1
Avena Sativa (Oat) Kernel Flour
(Abrasive, Absorbent, Bulking Agent, Viscosity Increasing Agent, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
Di-PPG-2 Myreth-10 Adipate
(Skin Conditioning, Emollient, Surfactant)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Glyceryl Oleate
(Fragrance, Skin Conditioning, Emollient, Emulsifying, Surfactant, Perfuming)
Fungal Acne
Fungal Acne Trigger
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
1
Lauryl Methyl Gluceth-10 Hydroxypropyldimonium Chloride
(Antistatic Agent, Hair Conditioning)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
2
A
Tetrasodium EDTA
(Chelating Agent)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
8
B
Quaternium-15
(Preservative)
3
A
PEG-14M
(Binding Agent, Emulsion Stabilising, Viscosity Increasing Agent)
8
Fragrance
(Deodorant, Masking, Perfuming)
4
Anthemis Nobilis (Chamomile)

My Ingredient Notes

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Di-PPG-2 Myreth-10 Adipate
Skin Conditioning, Emollient
Glycerin
Humectant, Skin Protecting
Glyceryl Oleate
Skin Conditioning, Emollient

Benefits

No standout benefits flagged for this product.

Concerns

Contains sulfate
Not fungal acne (malassezia) safe
Quaternium-15 — higher EWG
Fragrance — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Di-PPG-2 Myreth-10 Adipate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningEmollientSurfactant
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
Lauryl Methyl Gluceth-10 Hydroxypropyldimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Tetrasodium EDTA
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Chelating agent
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
PEG-14M
Binding agent, Emulsion stabilising
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Binding agentEmulsion stabilisingViscosity increasing agent
Anthemis Nobilis (Chamomile)
Other
Low-to-moderate hazard.Read moreShow less
EWG 4
Sodium Laureth Sulfate
Cleansing, Emulsifying
Potentially comedogenic - can block poresRead moreShow less
EWG 3 CleansingEmulsifyingFoamingSurfactant Bad for Oily SkinSulfate
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
PEG-80 Sorbitan Laurate
Fragrance, Sufactant
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR B FragranceSufactantSurfactantEmulsifying
Avena Sativa (Oat) Kernel Flour
Abrasive, Absorbent
Low-hazard ingredient.Read moreShow less
EWG 1 AbrasiveAbsorbentBulking agentViscosity increasing agentViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Glyceryl Oleate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningEmollientEmulsifyingSurfactantPerfuming Fungal-acne trigger
Quaternium-15
Preservative
Higher-hazard ingredient.Read moreShow less
EWG 8 CIR B Preservative
Fragrance
Deodorant, Masking
Higher-hazard ingredient.Read moreShow less
EWG 8 DeodorantMaskingPerfuming

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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