Daily Moisture+ Oat Milk Blend Shampoo

Aveeno

Daily Moisture+ Oat Milk Blend Shampoo

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About this product

The Aveeno Daily Moisture+ Oat Milk Blend Shampoo is a misc. Our analysis of its 30 ingredients (24 low-risk) rates it Excellent (99/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
30
Low-risk
24
Fragrance
Contains fragrance
Origin
United States
Data updated
Jun 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/7
Good for dry skin
Glycol Distearate Glycerin Propylene Glycol Coconut Acid PEG-7 Amodimethicone
Caution for dry skin
Glycerin Coconut Acid PPG-2 Hydroxyethyl Cocamide Hexylene Glycol Sodium C14-16 Olefin Sulfonate Sodium Hydroxide Laureth-4
Oily/Acne-Prone Skin No data
Sensitive Skin 2/9
Good for sensitive skin
Glycerin Tocopheryl Acetate
Caution for sensitive skin
Sodium Citrate Sodium Chloride Glycerin Propylene Glycol Formic Acid Hexylene Glycol Citric Acid Sodium Benzoate Laureth-4

Ingredients list

30 total
Lower hazard (1) Higher hazard (4)
All30 Skin Conditioning10 Fragrance7 Humectant6 Antistatic Agent6 Emulsifying6 Hair Conditioning5 Surfactant5 Film Forming5
EWG CIR Ingredient Name & Cosmetic Functions Notes
Colloidal Oatmeal Extract
(Hair Conditioning, Humectant, Opacifying, Skin Conditioning)
1
Water
(Solvent)
2
B
Sodium C14-16 Olefin Sulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
Hydrolyzed Milk Protein
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Prunus Amygdalus Dulcis Seed Extract
(Skin Conditioning)
3
PEG-7 Amodimethicone
(Skin Conditioning, Emollient, Hair Conditioning, Humectant)
1
A
Polyquaternium-22
(Antistatic Agent, Film Forming, Hair Fixing)
2
A
Polyquaternium-39
(Antistatic Agent, Film Forming, Hair Fixing)
Sodium Hydrolyzed Potato Starch Dodecenylsuccinate
(Surfactant Cleansing, Surfactant Foam Boosting)
1
Linoleamidopropyl PG-Dimonium Chloride Phosphate
(Antistatic Agent)
2
3
B
Laureth-4
(Antistatic Agent, Emulsifying, Masking, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
3
A
PEG-150 Pentaerythrityl Tetrastearate
(Viscosity Increasing Agent, Emulsifying)
1
PPG-2 Hydroxyethyl Cocamide
(Emulsifying, Surfactant, Foam Boosting, Viscosity Increasing Agent)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
(Emulsion Stabilising, Film Forming, Viscosity Controlling)
1
A
Hexylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Emulsifying, Perfuming, Skin Conditioning, Surfactant)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
1
Formic Acid
(Fragrance, Ph Adjuster, Preservative)
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
Leuconostoc/Radish Root Ferment Filtrate
(Antidandruff Agent, Antimicrobial)
1
A
Coconut Acid
(Cleansing, Emollient, Emulsifying, Surfactant)
Disodium Tetrapropenyl Succinate
(Anticorrosive, Surfactant Cleansing)
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

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Key ingredients

Vitamin E
Protects skin and soothes irritation.
Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
BrighteningRestores radiance to dull, tired skin.
Reduces IrritationEases discomfort and supports skin resilience.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.

Concerns

Contains sulfate
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Colloidal Oatmeal Extract
Hair conditioning, Humectant
Limited public safety data.Read moreShow less
EWG N/A Hair conditioningHumectantOpacifyingSkin conditioning
Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Hydrolyzed Milk Protein
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioning
Prunus Amygdalus Dulcis Seed Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
PEG-7 Amodimethicone
Skin conditioning, Emollient
Low-to-moderate hazard.Read moreShow less
EWG 3 Skin conditioningEmollientHair conditioningHumectant
Polyquaternium-22
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Polyquaternium-39
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antistatic agentFilm formingHair fixing
Sodium Hydrolyzed Potato Starch Dodecenylsuccinate
Surfactant - cleansing, Surfactant - foam boosting
Limited public safety data.Read moreShow less
EWG N/A Surfactant - cleansingSurfactant - foam boosting
Linoleamidopropyl PG-Dimonium Chloride Phosphate
Antistatic agent
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agent
PEG-150 Pentaerythrityl Tetrastearate
Viscosity increasing agent, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Viscosity increasing agentEmulsifying
PPG-2 Hydroxyethyl Cocamide
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 EmulsifyingSurfactantFoam boostingViscosity increasing agent
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
Emulsion stabilising, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Emulsion stabilisingFilm formingViscosity controlling
Hexylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentEmulsifyingPerfumingSkin conditioningSurfactant
+ 8 more — see the full ingredients list above
Sodium C14-16 Olefin Sulfonate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B CleansingFoamingSurfactant Sulfate
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Laureth-4
Antistatic agent, Emulsifying
Potentially comedogenic - can block poresRead moreShow less
EWG 2–3 CIR B Antistatic agentEmulsifyingMaskingSurfactant Bad for Oily Skin
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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