Avon Makeup Remover Wipes with Mineral Complex

Avon

Avon Makeup Remover Wipes with Mineral Complex

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About this product

The Avon Makeup Remover Wipes with Mineral Complex is a makeup remover. Our analysis of its 27 ingredients (24 low-risk) rates it Excellent (91/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Makeup Removers
Ingredients
27
Low-risk
24
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 8/4
Good for dry skin
Glyceryl Stearate Cetearyl Alcohol Cetearyl Isononanoate Cetyl Palmitate Chamomilla Recutita (Matricaria) Flower Extract Butylene Glycol Glycerin Camellia Sinensis Leaf Extract
Caution for dry skin
Glycerin Camellia Sinensis Leaf Extract Ceteareth-20 Ceteareth-12
Oily/Acne-Prone Skin 1/1
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Caution for oily/acne-prone skin
Chamomilla Recutita (Matricaria) Flower Extract
Sensitive Skin 4/11
Good for sensitive skin
Chamomilla Recutita (Matricaria) Flower Extract Glycerin Camellia Sinensis Leaf Extract Tocopheryl Acetate
Caution for sensitive skin
Cetyl Palmitate Sodium Citrate Chamomilla Recutita (Matricaria) Flower Extract Butylene Glycol Glycerin Citric Acid Camellia Sinensis Leaf Extract Benzoic Acid Phenoxyethanol Fragrance Ceteareth-12

Ingredients list

27 total
Lower hazard (1) Higher hazard (8)
All27 Skin Conditioning16 Fragrance7 Masking7 Emollient5 Emulsifying4 Humectant4 Preservative3 Ph Adjuster3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Cetearyl Isononanoate
(Hair Conditioning, Skin Conditioning, Emollient)
1
Saccharomyces/Copper Ferment
(Skin Conditioning)
2
Saccharomyces/Iron Ferment
(Skin Conditioning)
1
Saccharomyces/Magnesium Ferment
(Not Reported)
3
Saccharomyces/Zinc Ferment
(Skin Conditioning)
1
Saccharomyces/Silicon Ferment
(Skin Conditioning)
1
Leuconostoc/Radish Root Ferment Filtrate
(Antidandruff Agent, Antimicrobial)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
Aspalathus Linearis Leaf Extract
(Skin Conditioning)
1
B
Chamomilla Recutita (Matricaria) Flower Extract
(Fragrance, Skin Conditioning, Skin Conditioning Agent Occlusive, Perfuming)
Good for Sensitive Skin
Good for Sensitive Skin
Good for Dry Skin
Good for Dry Skin
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
3
B
Ceteareth-20
(Cleansing, Emulsifying, Surfactant)
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
1
A
Glyceryl Stearate
(Emollient, Emulsifying)
Fungal Acne
Fungal Acne Trigger
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
7
B
Ceteareth-12
(Emulsifying, Surfactant)
1
B
Cetyl Palmitate
(Fragrance, Emollient, Masking, Skin Conditioning)
1
A
Dehydroacetic Acid
(Preservative)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
8
Fragrance
(Deodorant, Masking, Perfuming)

My Ingredient Notes

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Key ingredients

Cetearyl Isononanoate
Skin Conditioning, Emollient
Saccharomyces/Copper Ferment
Skin Conditioning
Saccharomyces/Iron Ferment
Skin Conditioning
Saccharomyces/Zinc Ferment
Skin Conditioning
Saccharomyces/Silicon Ferment
Skin Conditioning
Camellia Sinensis Leaf Extract
Antioxidant, Astringent

Benefits

Good for dry skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
Ceteareth-12 — higher EWG
Fragrance — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Isononanoate
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningEmollient
Saccharomyces/Copper Ferment
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Saccharomyces/Iron Ferment
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 2 Skin conditioning
Saccharomyces/Magnesium Ferment
Not reported
Low-hazard ingredient.Read moreShow less
EWG 1 Not reported
Saccharomyces/Zinc Ferment
Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 Skin conditioning
Saccharomyces/Silicon Ferment
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Leuconostoc/Radish Root Ferment Filtrate
Antidandruff agent, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 1 Antidandruff agentAntimicrobial
Aspalathus Linearis Leaf Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Ceteareth-20
Cleansing, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B CleansingEmulsifyingSurfactant
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Cetyl Palmitate
Fragrance, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceEmollientMaskingSkin conditioning
Dehydroacetic Acid
Preservative
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Preservative
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
+ 1 more — see the full ingredients list above
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Chamomilla Recutita (Matricaria) Flower Extract
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceSkin conditioningSkin-conditioning agent -occlusivePerfuming Good for Sensitive SkinGood for Dry Skin
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glyceryl Stearate
Emollient, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientEmulsifying Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin
Ceteareth-12
Emulsifying, Surfactant
Higher-hazard ingredient.Read moreShow less
EWG 3–7 CIR B EmulsifyingSurfactant
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Fragrance
Deodorant, Masking
Higher-hazard ingredient.Read moreShow less
EWG 8 DeodorantMaskingPerfuming

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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