Extra Mild Shampoo

BABE Laboratorios

Where to buy Possibly in stock

About this product

The BABE Laboratorios Extra Mild Shampoo is a misc. Our analysis of its 26 ingredients (20 low-risk) rates it Excellent (95/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
26
Low-risk
20
Fragrance
Contains fragrance
Origin
Spain
Data updated
May 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/5
Good for dry skin
Gluconolactone Sodium PCA Propylene Glycol Pantolactone PEG-7 Glyceryl Cocoate
Caution for dry skin
Lauryl Glucoside Terpineol Sodium Laureth Sulfate PEG-200 Hydrogenated Glyceryl Palmate PEG-7 Glyceryl Cocoate
Oily/Acne-Prone Skin No data
Sensitive Skin 0/9
Caution for sensitive skin
Gluconolactone Sodium Chloride Propylene Glycol Terpineol Tetramethyl Acetyloctahydronaphthalenes Citric Acid Benzoic Acid Sodium Benzoate Phenoxyethanol

Ingredients list

26 total
Lower hazard (1) Higher hazard (4)
All26 Skin Conditioning9 Fragrance8 Humectant6 Masking6 Antistatic Agent5 Solvent5 Surfactant4 Preservative4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
3
Sodium Laureth Sulfate
(Cleansing, Emulsifying, Foaming, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
Sulfate
Sulfate
3
PEG-200 Hydrogenated Glyceryl Palmate
(Cleansing, Emulsifying, Solvent, Surfactant)
1
B
Lauryl Glucoside
(Cleansing, Surfactant)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
B
Sodium PCA
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
MEL EXTRACT
(Moisturising)
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
4
B
PEG-7 Glyceryl Cocoate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
PARFUM
(Fragrance, Perfuming)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning)
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
Pantolactone
(Humectant)
1
Gluconolactone
(Fragrance, Humectant, Solvent)
1
Tetramethyl Acetyloctahydronaphthalenes
(Masking, Perfuming, Skin Conditioning)
1
Terpineol
(Denaturant, Masking, Perfuming, Solvent)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Tetrasodium Glutamate Diacetate
(Chelating Agent)
1
A
Dehydroacetic Acid
(Preservative)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)

My Ingredient Notes

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Key ingredients

PHA
Gently exfoliates and hydrates with less irritation.
Vitamin E
Protects skin and soothes irritation.
Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Anti-AgingSoftens lines and helps skin look youthful.
BrighteningRestores radiance to dull, tired skin.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.
Acne FightingFights acne and helps prevent breakouts.

Concerns

Contains paraben
Contains sulfate
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
PEG-200 Hydrogenated Glyceryl Palmate
Cleansing, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CleansingEmulsifyingSolventSurfactant
Lauryl Glucoside
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSurfactant
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
MEL EXTRACT
Moisturising
Limited public safety data.Read moreShow less
EWG N/A Moisturising
TOCOPHEROL
Antioxidant, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntioxidantFragranceSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Pantolactone
Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Humectant
Gluconolactone
Fragrance, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceHumectantSolvent
Tetramethyl Acetyloctahydronaphthalenes
Masking, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingPerfumingSkin conditioning
Terpineol
Denaturant, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 DenaturantMaskingPerfumingSolvent
+ 3 more — see the full ingredients list above
Sodium Laureth Sulfate
Cleansing, Emulsifying
Potentially comedogenic - can block poresRead moreShow less
EWG 3 CleansingEmulsifyingFoamingSurfactant Bad for Oily SkinSulfate
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Sodium PCA
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioning Good for Dry Skin
PEG-7 Glyceryl Cocoate
Skin conditioning, Emollient
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Skin conditioningEmollientEmulsifyingSurfactant Fungal-acne trigger
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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