Hyaluron Pflegelotion

Balea

Where to buy Possibly in stock

About this product

The Balea Hyaluron Pflegelotion is a misc. Our analysis of its 15 ingredients (10 low-risk) rates it Excellent (94/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
15
Low-risk
10
Fragrance
Contains fragrance
Origin
Germany
Data updated
May 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/3
Good for dry skin
Ethylhexyl Stearate Isoamyl Laurate Sodium Hyaluronate Glycerin Polyglyceryl-3 Diisostearate
Caution for dry skin
Glycerin Polyglyceryl-3 Diisostearate Sodium Hydroxide
Oily/Acne-Prone Skin No data
Sensitive Skin 1/6
Good for sensitive skin
Glycerin
Caution for sensitive skin
Isoamyl Laurate Glycerin Citric Acid Sodium Benzoate Phenoxyethanol Benzyl Alcohol

Ingredients list

15 total
Lower hazard (1) Higher hazard (5)
All15 Skin Conditioning7 Fragrance7 Solvent3 Preservative3 Emollient3 Masking3 Humectant3 Emulsion Stabilising2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
HELIANTHUS ANNUUS HYBRID OIL
(Skin Conditioning Emollient)
1
B
Ethylhexyl Stearate
(Skin Conditioning, Emollient)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
Opuntia Ficus-Indica Fruit Water
(Antioxidant, Skin Conditioning, Skin Conditioning Emollient)
PARFUM
(Fragrance, Perfuming)
1
B
Isoamyl Laurate
(Fragrance, Skin Conditioning, Emollient)
1
B
Polyglyceryl-3 Diisostearate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
1
A
Carbomer
(Emulsion Stabilising, Viscosity Increasing Agent, Gel Forming, Viscosity Controlling)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
5
A
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking)
Allergens
Allergens
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Hyaluronic Acid
Hydrates by attracting and holding water.
Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Anti-AgingSoftens lines and helps skin look youthful.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
HELIANTHUS ANNUUS HYBRID OIL
Skin conditioning emollient
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning emollient
Ethylhexyl Stearate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollient
Opuntia Ficus-Indica Fruit Water
Antioxidant, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A AntioxidantSkin conditioningSkin conditioning emollient
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Isoamyl Laurate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceSkin conditioningEmollient
Carbomer
Emulsion stabilising, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingViscosity increasing agentGel formingViscosity controlling
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Polyglyceryl-3 Diisostearate
Skin conditioning, Emollient
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR B Skin conditioningEmollientEmulsifyingSurfactant Bad for Oily SkinFungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Benzyl Alcohol
External analgesic, Fragrance
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR A External analgesicFragranceOral health care drugPreservativeSolventViscosity decreasing agentMasking Allergens
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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