Kids Schampo / Balsam Hallon

Barnängen

Kids Schampo / Balsam Hallon

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About this product

The Barnängen Kids Schampo / Balsam Hallon is a misc. Our analysis of its 20 ingredients (17 low-risk) rates it Excellent (98/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
20
Low-risk
17
Fragrance
Contains fragrance
Origin
Sweden
Data updated
May 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/7
Good for dry skin
Glycerin
Caution for dry skin
Denatonium Benzoate Lauric Acid Sodium Laurate Sodium Lauroyl Methyl Isethionate Caprylyl/Capryl Glucoside Glycerin Coco-glucoside
Oily/Acne-Prone Skin No data
Sensitive Skin 1/7
Good for sensitive skin
Glycerin
Caution for sensitive skin
Denatonium Benzoate Lauric Acid Sodium Chloride Glycerin Citric Acid Sodium Benzoate Potassium Sorbate

Ingredients list

20 total
Lower hazard (1) Higher hazard (4)
All20 Fragrance7 Masking4 Surfactant4 Cleansing4 Emulsifying3 Antistatic Agent3 Hair Conditioning3 Skin Conditioning3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Lauroyl Methyl Isethionate
(Cleansing, Surfactant)
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
Rubus Idaeus Juice
(Astringent, Skin Conditioning, Smoothing, Tonic)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
Caprylyl/Capryl Glucoside
(Cleansing, Foaming, Surfactant)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
PARFUM
(Fragrance, Perfuming)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Sodium Methyl Isethionate
(Emulsifying)
1
A
Lauric Acid
(Fragrance, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Lauric Acid., Emulsifying)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
2
Zinc Laurate
(Anticaking Agent, Slip Modifier, Viscosity Increasing Agent, Opacifying, Viscosity Controlling)
1
Trisodium Ethylenediamine Disuccinate
(Chelating Agent)
1
Sodium Laurate
(Cleansing, Emulsifying, Surfactant)
1
A
Denatonium Benzoate
(Denaturant, Fragrance, Masking)
3
A
Potassium Sorbate
(Fragrance, Preservative)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Rubus Idaeus Juice
Astringent, Skin Conditioning
Panthenol
Skin Conditioning

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.

Concerns

Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Sodium Lauroyl Methyl Isethionate
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSurfactant
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
Rubus Idaeus Juice
Astringent, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A AstringentSkin conditioningSmoothingTonic
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Caprylyl/Capryl Glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CleansingFoamingSurfactant
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Sodium Methyl Isethionate
Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 Emulsifying
Zinc Laurate
Anticaking agent, Slip modifier
Low-hazard ingredient.Read moreShow less
EWG 2 Anticaking agentSlip modifierViscosity increasing agentOpacifyingViscosity controlling
Trisodium Ethylenediamine Disuccinate
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Sodium Laurate
Cleansing, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CleansingEmulsifyingSurfactant
Denatonium Benzoate
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DenaturantFragranceMasking
+ 1 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Lauric Acid
Fragrance, Sufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.Emulsifying Bad for Oily SkinFungal-acne trigger

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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