Patent Shine 10X Nail Lacquer

butter LONDON

Patent Shine 10X Nail Lacquer

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About this product

The butter LONDON Patent Shine 10X Nail Lacquer is a misc. Our analysis of its 20 ingredients (15 low-risk) rates it Excellent (96/100).

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
20
Low-risk
15
Fragrance
Fragrance-free
Data updated
Jun 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 0/2
Caution for dry skin
Nitrocellulose Stearalkonium Hectorite
Oily/Acne-Prone Skin No data
Sensitive Skin 0/6
Caution for sensitive skin
Butyl Acetate Acetyl Tributyl Citrate Ethyl Acetate Citric Acid Isopropyl Alcohol Malic Acid

Ingredients list

20 total
Lower hazard (1) Higher hazard (4)
All20 Fragrance6 Film Forming5 Colorant4 Solvent3 Masking3 Perfuming3 Plasticizer3 Viscosity Controlling3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
A
Butyl Acetate
(Fragrance, Solvent, Masking)
1
Ethyl Acetate
(Fragrance, Solvent, Perfuming)
1
Nitrocellulose
(Film Forming, Suspending Agent Nonsurfactant)
1
Tosylamide/Epoxy Resin
(Film Forming, Plasticizer)
1
Acetyl Tributyl Citrate
(Fragrance, Plasticizer, Film Forming, Masking, Perfuming)
2
A
Isopropyl Alcohol
(Antifoaming Agent, Fragrance, Solvent, Viscosity Decreasing Agent, Perfuming, Viscosity Controlling)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Stearalkonium Hectorite
(Suspending Agent Nonsurfactant, Gel Forming, Viscosity Controlling)
1
A
Synthetic Fluorphlogopite
(Bulking Agent, Viscosity Increasing Agent, Viscosity Controlling)
4
A
Benzophenone-1
(Uv Absorber)
2
A
Styrene/Acrylates Copolymer
(Film Forming, Opacifying)
3
4
B
Malic Acid
(Fragrance, Ph Adjuster, Buffering Agent)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Bambusa Vulgaris Extract
(Skin Conditioning)
1
Polymethylsilsesquioxane
(Opacifying)
Ethyl Trimethylbenzoyl Phenylphosphinate
(Uv Absorber)
1
Diamond powder
(Abrasive)
2
Iron Oxides
(Colorant, Cosmetic Colorant)
CI 77891
(Colorant)
1
CI 77492
(Colorant, Cosmetic Colorant)
CI 77007
(Colorant)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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No close formula match yet — browse other products like this

Key ingredients

Exfoliators
Removes dead skin cells to smoothe texture.

Benefits

Reduces IrritationEases discomfort and supports skin resilience.

Concerns

May not suit dry skin
May not suit sensitive skin

Ingredients explained

Butyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventMasking
Ethyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceSolventPerfuming
Nitrocellulose
Film forming, Suspending agent - nonsurfactant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingSuspending agent - nonsurfactant
Tosylamide/Epoxy Resin
Film forming, Plasticizer
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingPlasticizer
Acetyl Tributyl Citrate
Fragrance, Plasticizer
Low-hazard ingredient.Read moreShow less
EWG 1 FragrancePlasticizerFilm formingMaskingPerfuming
Stearalkonium Hectorite
Suspending agent - nonsurfactant, Gel forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Suspending agent - nonsurfactantGel formingViscosity controlling
Synthetic Fluorphlogopite
Bulking agent, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Bulking agentViscosity increasing agentViscosity controlling
Benzophenone-1
Uv absorber
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Uv absorber
Styrene/Acrylates Copolymer
Film forming, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Film formingOpacifying
Malic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3–4 CIR B FragrancePh adjusterBuffering agent
Bambusa Vulgaris Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Polymethylsilsesquioxane
Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 Opacifying
Ethyl Trimethylbenzoyl Phenylphosphinate
Uv absorber
Limited public safety data.Read moreShow less
EWG N/A Uv absorber
Diamond powder
Abrasive
Low-hazard ingredient.Read moreShow less
EWG 1 Abrasive
Iron Oxides
Colorant, Cosmetic colorant
Low-hazard ingredient.Read moreShow less
EWG 2 ColorantCosmetic colorant
+ 3 more — see the full ingredients list above
Isopropyl Alcohol
Antifoaming agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antifoaming agentFragranceSolventViscosity decreasing agentPerfumingViscosity controlling Bad for Sensitive Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.
  • 2 Wear SPF the next day: Acids and retinoids increase sun sensitivity — daily sunscreen is a must while using this.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

AHA (acid exfoliant) 5–10% (OTC)

OTC leave-on AHAs are usually 5–10%. The effect also depends on pH and free-acid value, not the percentage alone.

Malic Acid

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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