Propolis Energy Boosting Essence

By WISHTREND

Where to buy Possibly in stock

About this product

The By WISHTREND Propolis Energy Boosting Essence is a serums, essence, ampoule. Our analysis of its 19 ingredients (14 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry skin.

Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Serums, Essence, Ampoules
Ingredients
19
Low-risk
14
Fragrance
Fragrance-free
Origin
South Korea
Data updated
Jun 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/1
Good for dry skin
Butylene Glycol Glycerin
Caution for dry skin
Glycerin
Oily/Acne-Prone Skin No data
Sensitive Skin 1/4
Good for sensitive skin
Glycerin
Caution for sensitive skin
Sodium Citrate Butylene Glycol Glycerin Citric Acid

Ingredients list

19 total
Lower hazard (1) Higher hazard (2)
All19 Skin Conditioning13 Solvent6 Viscosity Controlling3 Masking3 Fragrance3 Humectant3 Emulsion Stabilising2 Film Forming2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
salix alba bark extract
(Astringent, Hair Conditioning, Skin Conditioning, Soothing, Tonic)
1
Centaurea Cyanus Flower Water
(Skin Conditioning)
Schisandra Chinensis Fruit Extract
(Skin Conditioning)
1
Morus Alba Bark Extract
(Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
Nelumbo Nucifera Leaf Extract
(Skin Conditioning)
1
Methylpropanediol
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Saccharomyces/Honey Ferment Filtrate
(Skin Conditioning)
1
Saccharomyces/Xylinum/Black Tea Ferment
(Skin Conditioning)
1
A
1,2-Hexanediol
(Solvent)
1
Propolis Extract
(Skin Conditioning)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
Benzyl Glycol
(Solvent)
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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No close formula match yet — browse other products like this

Key ingredients

Propolis
Soothes inflammation and supports healing.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.
Acne FightingFights acne and helps prevent breakouts.
Good For Oily SkinBalances oil and helps reduce shine.
Dark SpotsFades dark spots for even skin tone.

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
salix alba bark extract
Astringent, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A AstringentHair conditioningSkin conditioningSoothingTonic
Centaurea Cyanus Flower Water
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Schisandra Chinensis Fruit Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Nelumbo Nucifera Leaf Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Methylpropanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Saccharomyces/Honey Ferment Filtrate
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Saccharomyces/Xylinum/Black Tea Ferment
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Propolis Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Benzyl Glycol
Solvent
Limited public safety data.Read moreShow less
EWG N/A Solvent
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Morus Alba Bark Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Apply after toner and before moisturiser — thinnest to thickest.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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