Propolis Amino Cleanser

CNP Laboratory

Where to buy Possibly in stock

About this product

The CNP Laboratory Propolis Amino Cleanser is a cleanser. Our analysis of its 19 ingredients (16 low-risk) rates it Excellent (90/100).

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
19
Low-risk
16
Fragrance
Fragrance-free
Origin
South Korea
Data updated
Jun 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/5
Good for dry skin
Butylene Glycol Glycerin
Caution for dry skin
Sodium Methyl Cocoyl Taurate Glycerin Coco-glucoside Potassium Cocoyl Glycinate Acrylates Copolymer
Oily/Acne-Prone Skin No data
Sensitive Skin 1/9
Good for sensitive skin
Glycerin
Caution for sensitive skin
Pelargonium Graveolens Flower Oil Sodium Chloride Butylene Glycol Glycerin Tromethamine Sodium Benzoate Linalool Citronellol Geraniol

Ingredients list

19 total
Lower hazard (1) Higher hazard (7)
All19 Masking8 Skin Conditioning8 Fragrance7 Solvent4 Viscosity Controlling4 Hair Conditioning3 Humectant3 Surfactant3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Lauryl Hydroxysultaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Potassium Cocoyl Glycinate
(Hair Conditioning, Surfactant)
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
1
A
1,2-Hexanediol
(Solvent)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
2
A
Tromethamine
(Fragrance, Ph Adjuster, Buffering Agent, Masking)
1
Pelargonium Graveolens Flower Oil
(Masking)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
Propolis Extract
(Skin Conditioning)
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
7
Geraniol
(Fragrance, Masking, Tonic)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens

My Ingredient Notes

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Key ingredients

Propolis
Soothes inflammation and supports healing.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.
Acne FightingFights acne and helps prevent breakouts.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Show all 6 benefits

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
Geraniol — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Lauryl Hydroxysultaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Potassium Cocoyl Glycinate
Hair conditioning, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSurfactant
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Tromethamine
Fragrance, Ph adjuster
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A FragrancePh adjusterBuffering agentMasking
Pelargonium Graveolens Flower Oil
Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Masking
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Propolis Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Geraniol
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMaskingTonic Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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