Hard Rock Base And Top Coat Nail Strengthening

Deborah Lippman

Hard Rock Base And Top Coat Nail Strengthening

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About this product

The Deborah Lippman Hard Rock Base And Top Coat Nail Strengthening is a misc. Our analysis of its 17 ingredients (14 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
17
Low-risk
14
Fragrance
Fragrance-free
Origin
United States
Data updated
May 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/3
Good for dry skin
Hydrolyzed Soy Protein
Caution for dry skin
Nitrocellulose Camellia Oleifera Leaf Extract Camphor
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Oleifera Leaf Extract
Sensitive Skin 1/4
Good for sensitive skin
Camphor
Caution for sensitive skin
Butyl Acetate Ethyl Acetate Isopropyl Alcohol Camphor

Ingredients list

17 total
Lower hazard (1) Higher hazard (4)
All17 Solvent5 Skin Conditioning5 Fragrance4 Viscosity Controlling4 Plasticizer4 Film Forming3 Hair Conditioning3 Masking2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
A
Butyl Acetate
(Fragrance, Solvent, Masking)
1
Ethyl Acetate
(Fragrance, Solvent, Perfuming)
1
Nitrocellulose
(Film Forming, Suspending Agent Nonsurfactant)
Sd Alcohol 39
(Astringent, Solvent, Viscosity Controlling)
1
Phthalic Anhydride/Trimellitic Anhydride/Glycols Copolymer
(Film Forming, Viscosity Controlling)
2
Trimethyl Pentanyl Diisobutyrate
(Plasticizer)
2
A
Isopropyl Alcohol
(Antifoaming Agent, Fragrance, Solvent, Viscosity Decreasing Agent, Perfuming, Viscosity Controlling)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Water
(Solvent)
2
Camphor
(Denaturant, External Analgesic, Fragrance, Plasticizer, Masking)
Good for Oily Skin
Good for Oily Skin
1
Etocrylene
(Uv Absorber)
4
A
Benzophenone-1
(Uv Absorber)
1
Diamond powder
(Abrasive)
A
Hydrolyzed Soy Protein
(Antistatic Agent, Hair Conditioning, Humectant, Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
A
Nylon-12
(Bulking Agent, Opacifying, Viscosity Controlling)
1
A
Biotin
(Hair Conditioning, Skin Conditioning, Antiseborrhoeic)
1
Camellia Oleifera Leaf Extract
(Astringent, Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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No close formula match yet — browse other products like this

Key ingredients

Exfoliators
Removes dead skin cells to smoothe texture.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Reduces IrritationEases discomfort and supports skin resilience.
Good For Oily SkinBalances oil and helps reduce shine.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.
Show all 6 benefits

Concerns

May not suit dry skin
May not suit sensitive skin

Ingredients explained

Butyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventMasking
Ethyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceSolventPerfuming
Nitrocellulose
Film forming, Suspending agent - nonsurfactant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingSuspending agent - nonsurfactant
Sd Alcohol 39
Astringent, Solvent
Limited public safety data.Read moreShow less
EWG N/A AstringentSolventViscosity controlling
Phthalic Anhydride/Trimellitic Anhydride/Glycols Copolymer
Film forming, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingViscosity controlling
Trimethyl Pentanyl Diisobutyrate
Plasticizer
Low-hazard ingredient.Read moreShow less
EWG 2 Plasticizer
Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Etocrylene
Uv absorber
Low-hazard ingredient.Read moreShow less
EWG 1 Uv absorber
Benzophenone-1
Uv absorber
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Uv absorber
Diamond powder
Abrasive
Low-hazard ingredient.Read moreShow less
EWG 1 Abrasive
Hydrolyzed Soy Protein
Antistatic agent, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A CIR A Antistatic agentHair conditioningHumectantSkin conditioning
Nylon-12
Bulking agent, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Bulking agentOpacifyingViscosity controlling
Biotin
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningAntiseborrhoeic
Camellia Oleifera Leaf Extract
Astringent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 AstringentSkin conditioning
Isopropyl Alcohol
Antifoaming agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antifoaming agentFragranceSolventViscosity decreasing agentPerfumingViscosity controlling Bad for Sensitive Skin
Camphor
Denaturant, External analgesic
Low-hazard ingredient.Read moreShow less
EWG 2 DenaturantExternal analgesicFragrancePlasticizerMasking Good for Oily Skin
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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