Curlbond Re-Coiling Mild Lather Cleanser

DevaCurl

Curlbond Re-Coiling Mild Lather Cleanser

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About this product

The DevaCurl Curlbond Re-Coiling Mild Lather Cleanser is a misc. Our analysis of its 32 ingredients (24 low-risk) rates it Excellent (93/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
32
Low-risk
24
Fragrance
Contains fragrance
Origin
United States
Data updated
Jun 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/11
Good for dry skin
Glycol Distearate Glycerin PEG-7 Glyceryl Cocoate
Caution for dry skin
Sodium Methyl Cocoyl Taurate Glycerin Sodium C14-16 Olefin Sulfonate Acrylates Copolymer Cetrimonium Chloride Sodium Hydroxide Polysorbate 20 PEG-150 Distearate PEG-200 Hydrogenated Glyceryl Palmate PEG-7 Glyceryl Cocoate Sodium Lauroyl Glycinate
Oily/Acne-Prone Skin No data
Sensitive Skin 1/7
Good for sensitive skin
Glycerin
Caution for sensitive skin
Succinic Acid Arginine Glycerin Citric Acid Sodium Benzoate Phenoxyethanol Linalool

Ingredients list

32 total
Lower hazard (1) Higher hazard (5)
All32 Skin Conditioning10 Fragrance9 Surfactant8 Antistatic Agent7 Emulsifying7 Hair Conditioning6 Masking5 Buffering Agent5
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
B
Sodium C14-16 Olefin Sulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
3
PEG-200 Hydrogenated Glyceryl Palmate
(Cleansing, Emulsifying, Solvent, Surfactant)
1
A
Succinic Acid
(Fragrance, Ph Adjuster, Buffering Agent, Masking)
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
3
A
Aminomethyl Propanol
(Ph Adjuster, Buffering Agent)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Cocamide MIPA
(Foam Boosting, Viscosity Increasing Agent, Emulsifying, Emulsion Stabilising, Viscosity Controlling)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
1
A
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning)
4
B
Isopropanolamine
(Ph Adjuster, Buffering Agent)
1
A
Lysine HCL
(Hair Conditioning, Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
3
B
PEG-150 Distearate
(Emulsifying, Surfactant, Viscosity Controlling)
4
B
PEG-7 Glyceryl Cocoate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
Sodium Lauroyl Glycinate
(Cleansing, Surfactant)
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
2
A
Chlorphenesin
(Cosmetic Biocide, Antimicrobial, Preservative)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
PARFUM
(Fragrance, Perfuming)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens

My Ingredient Notes

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Key ingredients

AHA
Exfoliates skin for a brighter complexion.
Vitamin E
Protects skin and soothes irritation.
Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.
BrighteningRestores radiance to dull, tired skin.
Redness ReducingSoothes visible redness and calms irritation.
Anti-AgingSoftens lines and helps skin look youthful.
Reduces IrritationEases discomfort and supports skin resilience.
Dark SpotsFades dark spots for even skin tone.

Concerns

Contains paraben
Contains sulfate
Contains eu allergen
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
PEG-200 Hydrogenated Glyceryl Palmate
Cleansing, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CleansingEmulsifyingSolventSurfactant
Succinic Acid
Fragrance, Ph adjuster
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragrancePh adjusterBuffering agentMasking
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Aminomethyl Propanol
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Ph adjusterBuffering agent
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Cocamide MIPA
Foam boosting, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 Foam boostingViscosity increasing agentEmulsifyingEmulsion stabilisingViscosity controlling
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning
Isopropanolamine
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Ph adjusterBuffering agent
Lysine HCL
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioning
PEG-150 Distearate
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactantViscosity controlling
+ 7 more — see the full ingredients list above
Sodium C14-16 Olefin Sulfonate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B CleansingFoamingSurfactant Sulfate
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
PEG-7 Glyceryl Cocoate
Skin conditioning, Emollient
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Skin conditioningEmollientEmulsifyingSurfactant Fungal-acne trigger
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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