Repair Hair Mask

Dr. Barbara Sturm

Where to buy Possibly in stock

About this product

The Dr. Barbara Sturm Repair Hair Mask is a misc. Our analysis of its 19 ingredients (15 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
19
Low-risk
15
Fragrance
Fragrance-free
Origin
Germany
Data updated
May 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 4/2
Good for dry skin
Saccharide Isomerate Cetearyl Alcohol Glycerin Hydroxypropyltrimonium Hyaluronate
Caution for dry skin
Maltodextrin Glycerin
Oily/Acne-Prone Skin No data
Sensitive Skin 2/5
Good for sensitive skin
Glycerin Laminaria Digitata Extract
Caution for sensitive skin
Glycerin Lavandula Stoechas Extract Citric Acid Sodium Benzoate Potassium Sorbate

Ingredients list

19 total
Lower hazard (1) Higher hazard (3)
All19 Skin Conditioning8 Hair Conditioning5 Fragrance5 Emulsion Stabilising4 Film Forming4 Humectant4 Masking3 Solvent3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Hydrogenated Farnesene
(Skin Conditioning, Skin Conditioning Emollient, Solvent)
1
Distearoylethyl Dimonium Chloride
(Antistatic Agent, Hair Conditioning)
Butyrospermum Parkii Butter
(Skin Conditioning, Viscosity Controlling)
1
A
Maltodextrin
(Absorbent, Binding Agent, Emulsion Stabilising, Film Forming, Hair Conditioning, Skin Conditioning, Suspending Agent Nonsurfactant, Binding)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
3
A
Potassium Sorbate
(Fragrance, Preservative)
1
Hydroxypropyltrimonium Hyaluronate
(Film Forming, Humectant)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
Caesalpinia Spinosa Fruit Pod Extract
(Hair Conditioning, Hair Waving Or Straightening)
1
Laminaria Digitata Extract
(Skin Protecting)
Helianthus Annuus Sprout Extract
(Skin Conditioning)
1
Chlorella Vulgaris Extract
(Skin Conditioning)
1
Portulaca Oleracea Extract
(Skin Conditioning)
1
Saccharide Isomerate
(Humectant)
1
Lavandula Stoechas Extract
(Fragrance, Masking)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cetearyl Alcohol
Emollient
Glycerin
Humectant, Skin Protecting
Hydrogenated Farnesene
Skin Conditioning
Butyrospermum Parkii Butter
Skin Conditioning
Maltodextrin
Skin Conditioning
Panthenol
Skin Conditioning

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Scar HealingImproves the look of marks and scars.

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
Hydrogenated Farnesene
Skin conditioning, Skin conditioning emollient
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningSkin conditioning emollientSolvent
Distearoylethyl Dimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
Butyrospermum Parkii Butter
Skin conditioning, Viscosity controlling
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningViscosity controlling
Maltodextrin
Absorbent, Binding agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AbsorbentBinding agentEmulsion stabilisingFilm formingHair conditioningSkin conditioningSuspending agent - nonsurfactantBinding
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Potassium Sorbate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Hydroxypropyltrimonium Hyaluronate
Film forming, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingHumectant
Caesalpinia Spinosa Fruit Pod Extract
Hair conditioning, Hair waving or straightening
Limited public safety data.Read moreShow less
EWG N/A Hair conditioningHair waving or straightening
Laminaria Digitata Extract
Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 Skin protecting
Helianthus Annuus Sprout Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Chlorella Vulgaris Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Portulaca Oleracea Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Saccharide Isomerate
Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Humectant
+ 1 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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