Sun Drops SPF 50

Dr. Barbara Sturm

Where to buy Possibly in stock

About this product

The Dr. Barbara Sturm Sun Drops SPF 50 is a sunscreen. Our analysis of its 31 ingredients (27 low-risk) rates it Excellent (94/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sunscreen
Ingredients
31
Low-risk
27
Fragrance
Fragrance-free
Origin
Germany
SPF
50 · blocks 98.0% UVB
Data updated
Jun 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/10
Good for dry skin
Glyceryl Stearate Sodium Hyaluronate Glycerin Camellia Sinensis Leaf Extract Cyclopentasiloxane
Caution for dry skin
Glycereth-2 Cocoate Sodium Carboxymethyl Beta-Glucan Xanthan Gum Glycerin Cassia Alata Leaf Extract Potassium Cetyl Phosphate Aluminum Starch Octenylsuccinate Camellia Sinensis Leaf Extract Polysorbate 20 PEG-100 Stearate
Oily/Acne-Prone Skin 2/0
Good for oily/acne-prone skin
Cassia Alata Leaf Extract Camellia Sinensis Leaf Extract
Sensitive Skin 4/7
Good for sensitive skin
Anthemis Nobilis Flower Extract Glycerin Camellia Sinensis Leaf Extract Tocopheryl Acetate
Caution for sensitive skin
Arginine Anthemis Nobilis Flower Extract Glycerin Camellia Sinensis Leaf Extract Benzoic Acid Phenoxyethanol Homosalate

Ingredients list

31 total
Lower hazard (1) Higher hazard (6)
All31 Skin Conditioning20 Uv Absorber6 Fragrance5 Solvent5 Hair Conditioning5 Viscosity Controlling4 Surfactant4 Emulsifying4
EWG CIR Ingredient Name & Cosmetic Functions Notes
4
Homosalate
(Fragrance, Sunscreen Agent, Uv Absorber, Skin Conditioning, Uv Filter)
2
Butyl Methoxydibenzoylmethane
(Uv Absorber, Uv Filter)
6
Ethylhexyl Methoxycinnamate
(Uv Absorber, Uv Filter)
Bad for Oily Skin
Bad for Oily Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
4
Ethylhexyl Salicylate
(Uv Absorber, Uv Filter)
1
Water
(Solvent)
1
B
Butyloctyl Salicylate
(Hair Conditioning, Skin Conditioning, Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
2
A
Styrene/Acrylates Copolymer
(Film Forming, Opacifying)
1
B
Potassium Cetyl Phosphate
(Emulsifying, Surfactant)
3
A
Cyclopentasiloxane
(Hair Conditioning, Skin Conditioning, Emollient, Solvent)
Silicone
Silicone
1
A
Glyceryl Stearate
(Emollient, Emulsifying)
Fungal Acne
Fungal Acne Trigger
3
A
PEG-100 Stearate
(Surfactant)
Fungal Acne
Fungal Acne Trigger
2
B
Aluminum Starch Octenylsuccinate
(Absorbent, Anticaking Agent, Viscosity Increasing Agent, Viscosity Controlling)
1
Portulaca Oleracea Extract
(Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
2
Polyacrylate-13
(Film Forming)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
A
Xanthan Gum
(Binding Agent, Emulsion Stabilising, Skin Conditioning, Surfactant Emulsifying Agent, Viscosity Increasing Agent, Binding, Gel Forming, Viscosity Controlling)
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
Glycereth-2 Cocoate
(Emulsifying, Surfactant)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
1
A
Polyisobutene
(Binding Agent, Film Forming, Viscosity Increasing Agent, Binding, Viscosity Controlling)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Sodium Carboxymethyl Beta-Glucan
(Binding, Cleansing, Viscosity Controlling)
1
Anthemis Nobilis Flower Extract
(Masking, Perfuming, Skin Conditioning)
Good for Sensitive Skin
Good for Sensitive Skin
Good for Dry Skin
Good for Dry Skin
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
Cassia Alata Leaf Extract
(Cosmetic Astringent)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Chemical UV Filter
Absorbs UV rays to help prevent sun damage.
Antioxidants
Shields skin from free radical damage.
Vitamin E
Protects skin and soothes irritation.
Hyaluronic Acid
Hydrates by attracting and holding water.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Redness ReducingSoothes visible redness and calms irritation.
Reduces IrritationEases discomfort and supports skin resilience.
Barrier RepairStrengthen and restore your skin's natural barrier.
Scar HealingImproves the look of marks and scars.
Anti-AgingSoftens lines and helps skin look youthful.
BrighteningRestores radiance to dull, tired skin.
Good For Oily SkinBalances oil and helps reduce shine.

Concerns

Contains paraben
Contains silicone
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Homosalate
Fragrance, Sunscreen agent
Low-to-moderate hazard.Read moreShow less
EWG 4 FragranceSunscreen agentUv absorberSkin conditioningUv filter
Butyl Methoxydibenzoylmethane
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 2 Uv absorberUv filter
Ethylhexyl Salicylate
Uv absorber, Uv filter
Low-to-moderate hazard.Read moreShow less
EWG 4 Uv absorberUv filter
Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Butyloctyl Salicylate
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningSolvent
Styrene/Acrylates Copolymer
Film forming, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Film formingOpacifying
Potassium Cetyl Phosphate
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Aluminum Starch Octenylsuccinate
Absorbent, Anticaking agent
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AbsorbentAnticaking agentViscosity increasing agentViscosity controlling
Portulaca Oleracea Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Polyacrylate-13
Film forming
Low-hazard ingredient.Read moreShow less
EWG 2 Film forming
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Xanthan Gum
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingSkin conditioningSurfactant -emulsifying agentViscosity increasing agentBindingGel formingViscosity controlling
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Glycereth-2 Cocoate
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 EmulsifyingSurfactant
Polyisobutene
Binding agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentFilm formingViscosity increasing agentBindingViscosity controlling
+ 3 more — see the full ingredients list above
Ethylhexyl Methoxycinnamate
Uv absorber, Uv filter
Potentially a skin irritantRead moreShow less
EWG 6 Uv absorberUv filter Bad for Oily SkinBad for Sensitive Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Cyclopentasiloxane
Hair conditioning, Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Hair conditioningSkin conditioningEmollientSolvent Silicone
Glyceryl Stearate
Emollient, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientEmulsifying Fungal-acne trigger
PEG-100 Stearate
Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Surfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Anthemis Nobilis Flower Extract
Masking, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingPerfumingSkin conditioning Good for Sensitive SkinGood for Dry Skin
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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