White Tea Skin Solutions Gentle Purifying Cleanser

Elizabeth Arden

White Tea Skin Solutions Gentle Purifying Cleanser

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About this product

The Elizabeth Arden White Tea Skin Solutions Gentle Purifying Cleanser is a cleanser. Our analysis of its 26 ingredients (16 low-risk) rates it Excellent (89/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
26
Low-risk
16
Fragrance
Contains fragrance
Origin
United States
Data updated
May 2026

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/7
Good for dry skin
Caprylyl Glycol Butylene Glycol Glycerin Camellia Sinensis Leaf Extract PEG-7 Glyceryl Cocoate
Caution for dry skin
Glycerin Coco-glucoside Potassium Cocoyl Glycinate Acrylates Copolymer Camellia Sinensis Leaf Extract Sodium Hydroxide PEG-7 Glyceryl Cocoate
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 3/9
Good for sensitive skin
Glycerin Camellia Sinensis Leaf Extract Epigallocatechin Gallatyl Glucoside
Caution for sensitive skin
Myrtus Communis Leaf Extract Butylene Glycol Glycerin Citric Acid Camellia Sinensis Leaf Extract Benzoic Acid Phenoxyethanol Citronellol Geraniol

Ingredients list

26 total
Lower hazard (1) Higher hazard (7)
All26 Skin Conditioning12 Fragrance10 Masking6 Hair Conditioning5 Humectant5 Film Forming5 Ph Adjuster3 Emollient3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Potassium Cocoyl Glycinate
(Hair Conditioning, Surfactant)
1
A
Sodium Cocoamphoacetate
(Hair Conditioning, Sufactant, Foam Boosting, Foaming)
4
B
PEG-7 Glyceryl Cocoate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
Arginine Cocoate
(Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
Epigallocatechin Gallatyl Glucoside
(Antioxidant, Skin Conditioning)
Helianthus Annuus Seed Oil
(Fragrance, Skin Conditioning, Skin Conditioning Emollient)
1
Myrtus Communis Leaf Extract
(Perfuming, Skin Conditioning)
3
A
PEG-120 Methyl Glucose Dioleate
(Sufactant, Emulsifying)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
rosmarinus officinalis leaf extract
(Antimicrobial, Fragrance, Skin Conditioning)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
2
A
Styrene/Acrylates Copolymer
(Film Forming, Opacifying)
PARFUM
(Fragrance, Perfuming)
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
7
Geraniol
(Fragrance, Masking, Tonic)
Allergens
Allergens
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Barrier RepairStrengthen and restore your skin's natural barrier.
Anti-AgingSoftens lines and helps skin look youthful.
BrighteningRestores radiance to dull, tired skin.
Good For Oily SkinBalances oil and helps reduce shine.
Reduces Large PoresMinimizes the look of enlarged pores.

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Geraniol — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Potassium Cocoyl Glycinate
Hair conditioning, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSurfactant
Sodium Cocoamphoacetate
Hair conditioning, Sufactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSufactantFoam boostingFoaming
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Arginine Cocoate
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
Epigallocatechin Gallatyl Glucoside
Antioxidant, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A AntioxidantSkin conditioning
Helianthus Annuus Seed Oil
Fragrance, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceSkin conditioningSkin conditioning emollient
Myrtus Communis Leaf Extract
Perfuming, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 PerfumingSkin conditioning
PEG-120 Methyl Glucose Dioleate
Sufactant, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A SufactantEmulsifying
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
rosmarinus officinalis leaf extract
Antimicrobial, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntimicrobialFragranceSkin conditioning
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
+ 2 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
PEG-7 Glyceryl Cocoate
Skin conditioning, Emollient
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Skin conditioningEmollientEmulsifyingSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Geraniol
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMaskingTonic Allergens
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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