Higher Capacity Cleansing Fluid

EqualRXN

Where to buy Possibly in stock

About this product

The EqualRXN Higher Capacity Cleansing Fluid is a makeup remover. Our analysis of its 20 ingredients (19 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Makeup Removers
Ingredients
20
Low-risk
19
Fragrance
Fragrance-free
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/5
Good for dry skin
Butylene Glycol Glycerin Camellia Sinensis Leaf Extract
Caution for dry skin
Glycerin Potassium Cocoate Potassium Cocoyl Glycinate Hexylene Glycol Camellia Sinensis Leaf Extract
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 3/7
Good for sensitive skin
Melia Azadirachta Leaf Extract Glycerin Camellia Sinensis Leaf Extract
Caution for sensitive skin
Sodium Chloride Butylene Glycol Glycerin Hexylene Glycol 4-t-Butylcyclohexanol Citric Acid Camellia Sinensis Leaf Extract

Ingredients list

20 total
Lower hazard (1) Higher hazard (2)
All20 Skin Conditioning10 Solvent6 Masking5 Fragrance4 Hair Conditioning4 Humectant4 Viscosity Controlling3 Foam Boosting3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Potassium Cocoyl Glycinate
(Hair Conditioning, Surfactant)
1
B
Lauryl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent)
1
A
Disodium Cocoamphodiacetate
(Hair Conditioning, Sufactant, Foam Boosting, Hydrotrope, Skin Conditioning)
1
A
Potassium Cocoate
(Sufactant, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
A
Potassium Benzoate
(Preservative)
1
4-t-Butylcyclohexanol
(Masking, Perfuming)
Avena Sativa Meal Extract
(Soothing)
1
Houttuynia Cordata Extract
(Skin Conditioning)
1
Melia Azadirachta Leaf Extract
(Antimicrobial, Skin Protecting)
1
Melia Azadirachta Flower Extract
(Skin Conditioning)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
A
Hexylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Emulsifying, Perfuming, Skin Conditioning, Surfactant)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
A
1,2-Hexanediol
(Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Barrier RepairStrengthen and restore your skin's natural barrier.
Anti-AgingSoftens lines and helps skin look youthful.
BrighteningRestores radiance to dull, tired skin.
Good For Oily SkinBalances oil and helps reduce shine.
Reduces Large PoresMinimizes the look of enlarged pores.

Concerns

Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Potassium Cocoyl Glycinate
Hair conditioning, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSurfactant
Lauryl Betaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agent
Disodium Cocoamphodiacetate
Hair conditioning, Sufactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSufactantFoam boostingHydrotropeSkin conditioning
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Potassium Benzoate
Preservative
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Preservative
4-t-Butylcyclohexanol
Masking, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingPerfuming
Avena Sativa Meal Extract
Soothing
Limited public safety data.Read moreShow less
EWG N/A Soothing
Houttuynia Cordata Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Melia Azadirachta Leaf Extract
Antimicrobial, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 AntimicrobialSkin protecting
Melia Azadirachta Flower Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Hexylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentEmulsifyingPerfumingSkin conditioningSurfactant
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Potassium Cocoate
Sufactant, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A SufactantEmulsifyingSurfactant Fungal-acne trigger
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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