Argan And Hyaluronic Acid Nourishing Dermo Shampoo

Equilibra

Argan And Hyaluronic Acid Nourishing Dermo Shampoo

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About this product

The Equilibra Argan And Hyaluronic Acid Nourishing Dermo Shampoo is a misc. Our analysis of its 25 ingredients (21 low-risk) rates it Excellent (98/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
25
Low-risk
21
Fragrance
Contains fragrance
Origin
Italy

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 4/4
Good for dry skin
Glyceryl Oleate Betaine Sodium Hyaluronate Glycerin
Caution for dry skin
Glyceryl Oleate Ammonium Lauryl Sulfate Glycerin Coco-glucoside
Oily/Acne-Prone Skin No data
Sensitive Skin 1/6
Good for sensitive skin
Glycerin
Caution for sensitive skin
Glyceryl Oleate Sodium Chloride Glycerin Citric Acid Sodium Benzoate Potassium Sorbate

Ingredients list

25 total
Lower hazard (1) Higher hazard (4)
All25 Skin Conditioning11 Fragrance6 Hair Conditioning5 Humectant5 Solvent4 Perfuming4 Antistatic Agent4 Cosmetic Colorant3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Ammonium Lauryl Sulfate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Argania Spinosa Extract
(Skin Conditioning)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
1
B
Hydrolyzed Wheat Protein
(Film Forming, Hair Conditioning, Skin Conditioning, Antistatic Agent)
Linum Usitatissimum Seed Extract
(Perfuming, Skin Conditioning)
1
A
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning)
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
1
A
Glyceryl Oleate
(Fragrance, Skin Conditioning, Emollient, Emulsifying, Surfactant, Perfuming)
Fungal Acne
Fungal Acne Trigger
1
Sodium Phytate
(Chelating Agent, Oral Care Agent)
1
A
Sodium Benzotriazolyl Butylphenol Sulfonate
(Uv Absorber)
1
Buteth-3
(Solvent)
1
Tributyl Citrate
(Plasticizer, Solvent, Film Forming)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
A
Potassium Sorbate
(Fragrance, Preservative)
1
Sodium Levulinate
(Skin Conditioning)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
3
CI 19140
(Colorant, Cosmetic Colorant)
2
CI 42090
(Colorant, Cosmetic Colorant)
3
CI 14700
(Cosmetic Colorant)
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

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Key ingredients

Hyaluronic Acid
Hydrates by attracting and holding water.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Anti-AgingSoftens lines and helps skin look youthful.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.
Show all 6 benefits

Concerns

Contains sulfate
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Argania Spinosa Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Hydrolyzed Wheat Protein
Film forming, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Film formingHair conditioningSkin conditioningAntistatic agent
Linum Usitatissimum Seed Extract
Perfuming, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A PerfumingSkin conditioning
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
Sodium Phytate
Chelating agent, Oral care agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agentOral care agent
Sodium Benzotriazolyl Butylphenol Sulfonate
Uv absorber
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Uv absorber
Buteth-3
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Tributyl Citrate
Plasticizer, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 PlasticizerSolventFilm forming
Potassium Sorbate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Sodium Levulinate
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
+ 5 more — see the full ingredients list above
Ammonium Lauryl Sulfate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Sulfate
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Glyceryl Oleate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningEmollientEmulsifyingSurfactantPerfuming Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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