Centella Cleansing Gel

ERBORIAN

Where to buy Possibly in stock

About this product

The ERBORIAN Centella Cleansing Gel is a emulsion. Our analysis of its 23 ingredients (19 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
23
Low-risk
19
Fragrance
Contains fragrance
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/5
Good for dry skin
Squalane Butylene Glycol Glycerin Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract
Caution for dry skin
Sodium Methyl Cocoyl Taurate Glycerin Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract PEG-60 Hydrogenated Castor Oil
Oily/Acne-Prone Skin 2/0
Good for oily/acne-prone skin
Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract
Sensitive Skin 5/7
Good for sensitive skin
Glycerin Polygonum Cuspidatum Root Extract Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract Allantoin
Caution for sensitive skin
Sodium Chloride Butylene Glycol Glycerin Citric Acid Camellia Sinensis Leaf Extract Sodium Benzoate PEG-60 Hydrogenated Castor Oil

Ingredients list

23 total
Lower hazard (1) Higher hazard (3)
All23 Skin Conditioning14 Fragrance8 Masking5 Humectant5 Solvent4 Viscosity Controlling4 Skin Protecting4 Perfuming3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
B
Coco-Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
Polygonum Cuspidatum Root Extract
(Antioxidant)
CHAMOMILLA RECUTITA FLOWER EXTRACT
(Fragrance, Skin Conditioning)
rosmarinus officinalis leaf extract
(Antimicrobial, Fragrance, Skin Conditioning)
glycyrrhiza glabra root extract
(Bleaching, Perfuming, Skin Conditioning, Skin Conditioning Emollient, Smoothing, Soothing)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
Scutellaria Baicalensis Root Extract
(Astringent, Humectant, Soothing)
1
A
Allantoin
(Skin Conditioning, Skin Protecting, Soothing)
Good for Oily Skin
Good for Oily Skin
Good for Sensitive Skin
Good for Sensitive Skin
1
A
Squalane
(Emollient, Hair Conditioning, Refatting, Skin Conditioning)
1
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
(Emulsion Stabilising, Film Forming, Viscosity Controlling)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
3
B
PEG-60 Hydrogenated Castor Oil
(Fragrance, Sufactant, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
B
Potassium Hydroxide
(Ph Adjuster, Buffering Agent)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Glycerin
Humectant, Skin Protecting
Pentylene Glycol
Skin Conditioning
Coco-Betaine
Skin Conditioning
Butylene Glycol
Skin Conditioning, Humectant
Polygonum Cuspidatum Root Extract
Antioxidant
CHAMOMILLA RECUTITA FLOWER EXTRACT
Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Coco-Betaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Polygonum Cuspidatum Root Extract
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
CHAMOMILLA RECUTITA FLOWER EXTRACT
Fragrance, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceSkin conditioning
rosmarinus officinalis leaf extract
Antimicrobial, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntimicrobialFragranceSkin conditioning
glycyrrhiza glabra root extract
Bleaching, Perfuming
Limited public safety data.Read moreShow less
EWG N/A BleachingPerfumingSkin conditioningSkin conditioning emollientSmoothingSoothing
Scutellaria Baicalensis Root Extract
Astringent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 AstringentHumectantSoothing
Squalane
Emollient, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientHair conditioningRefattingSkin conditioning
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
Emulsion stabilising, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Emulsion stabilisingFilm formingViscosity controlling
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
Potassium Hydroxide
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Ph adjusterBuffering agent
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
+ 1 more — see the full ingredients list above
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Allantoin
Skin conditioning, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSkin protectingSoothing Good for Oily SkinGood for Sensitive Skin
PEG-60 Hydrogenated Castor Oil
Fragrance, Sufactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceSufactantSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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