No Nothing Sensitive Styling Mist

Four Reasons

No Nothing Sensitive Styling Mist

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About this product

The Four Reasons No Nothing Sensitive Styling Mist is a misc. Our analysis of its 13 ingredients (11 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
13
Low-risk
11
Fragrance
Fragrance-free
Origin
Finland

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/3
Good for dry skin
Propylene Glycol
Caution for dry skin
Sodium Cocoyl Amino Acids Cetrimonium Chloride Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 0/3
Caution for sensitive skin
Propylene Glycol Citric Acid Alcohol Denat.

Ingredients list

13 total
Lower hazard (1) Higher hazard (4)
All13 Skin Conditioning4 Antistatic Agent4 Solvent3 Viscosity Controlling3 Hair Conditioning3 Chelating Agent2 Humectant2 Fragrance2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
VP/VA Copolymer
(Binding, Film Forming, Hair Fixing)
Octylacrylamide/Acrylates/Butylaminoethyl Methacrylate Copolymer
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
1
B
Sodium Cocoyl Amino Acids
(Antistatic Agent, Cleansing, Surfactant)
3
A
Aminomethyl Propanol
(Ph Adjuster, Buffering Agent)
3
Potassium Dimethicone PEG-7 Panthenyl Phosphate
(Hair Conditioning, Skin Conditioning)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
Sodium Sarcosinate
(Hair Conditioning, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
2
A
Tetrasodium EDTA
(Chelating Agent)

My Ingredient Notes

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Key ingredients

Alcohol Denat.
Astringent
Panthenol
Skin Conditioning
Potassium Dimethicone PEG-7 Panthenyl Phosphate
Skin Conditioning
Propylene Glycol
Humectant, Skin Conditioning

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.
Barrier RepairStrengthen and restore your skin's natural barrier.

Concerns

May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
VP/VA Copolymer
Binding, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A BindingFilm formingHair fixing
Octylacrylamide/Acrylates/Butylaminoethyl Methacrylate Copolymer
Antistatic agent, Film forming
Limited public safety data.Read moreShow less
EWG N/A Antistatic agentFilm formingHair fixing
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Sodium Cocoyl Amino Acids
Antistatic agent, Cleansing
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentCleansingSurfactant
Aminomethyl Propanol
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Ph adjusterBuffering agent
Potassium Dimethicone PEG-7 Panthenyl Phosphate
Hair conditioning, Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 Hair conditioningSkin conditioning
Sodium Sarcosinate
Hair conditioning, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningViscosity controlling
Tetrasodium EDTA
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Chelating agent
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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