Curl Care Deep Conditioner

Hask

Curl Care Deep Conditioner

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About this product

The Hask Curl Care Deep Conditioner is a misc. Our analysis of its 26 ingredients (21 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
26
Low-risk
21
Fragrance
Contains fragrance
Origin
United States
SPF
7 · blocks 85.7% UVB

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 6/2
Good for dry skin
Cetearyl Alcohol Argania Spinosa Kernel Oil Isopropyl Palmitate Caprylyl Glycol Sodium PCA Glycerin
Caution for dry skin
Glycerin Cetrimonium Chloride
Oily/Acne-Prone Skin No data
Sensitive Skin 2/8
Good for sensitive skin
Glycerin Tocopheryl Acetate
Caution for sensitive skin
Vanillin Juniperus Virginiana Oil Isopropyl Palmitate Glycerin Tetramethyl Acetyloctahydronaphthalenes Citric Acid Alpha-Isomethyl Ionone Hexyl Cinnamal

Ingredients list

26 total
Lower hazard (1) Higher hazard (5)
All26 Skin Conditioning15 Fragrance8 Antistatic Agent6 Perfuming6 Hair Conditioning6 Masking5 Humectant5 Emollient4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
cocos nucifera oil
(Fragrance, Hair Conditioning, Perfuming, Skin Conditioning)
1
A
Argania Spinosa Kernel Oil
(Emollient, Skin Conditioning)
Fungal Acne
Fungal Acne Trigger
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
1
Polyimide-1
(Film Forming, Hair Fixing)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
B
Sodium PCA
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Isopropyl Palmitate
(Binding Agent, Fragrance, Skin Conditioning, Emollient, Antistatic Agent, Binding, Perfuming, Solvent)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
1
Tetrasodium Glutamate Diacetate
(Chelating Agent)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
3
Distearyldimonium Chloride
(Antistatic Agent, Hair Conditioning)
2
A
Chlorphenesin
(Cosmetic Biocide, Antimicrobial, Preservative)
3
B
Potassium Hydroxide
(Ph Adjuster, Buffering Agent)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
PARFUM
(Fragrance, Perfuming)
5
Alpha-Isomethyl Ionone
(Perfuming, Skin Conditioning)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
1
Juniperus Virginiana Oil
(Masking, Tonic)
1
Tetramethyl Acetyloctahydronaphthalenes
(Masking, Perfuming, Skin Conditioning)
1
Vanillin
(Flavoring Agent, Fragrance, Masking)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Vitamin E
Protects skin and soothes irritation.
Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Reduces IrritationEases discomfort and supports skin resilience.
BrighteningRestores radiance to dull, tired skin.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.
Dark SpotsFades dark spots for even skin tone.
Anti-AgingSoftens lines and helps skin look youthful.

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
cocos nucifera oil
Fragrance, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceHair conditioningPerfumingSkin conditioning
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Polyimide-1
Film forming, Hair fixing
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingHair fixing
TOCOPHEROL
Antioxidant, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntioxidantFragranceSkin conditioning
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
Tetrasodium Glutamate Diacetate
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Distearyldimonium Chloride
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 Antistatic agentHair conditioning
Chlorphenesin
Cosmetic biocide, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Cosmetic biocideAntimicrobialPreservative
Potassium Hydroxide
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Ph adjusterBuffering agent
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Juniperus Virginiana Oil
Masking, Tonic
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingTonic
+ 2 more — see the full ingredients list above
Argania Spinosa Kernel Oil
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientSkin conditioning Fungal-acne trigger
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Sodium PCA
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioning Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Isopropyl Palmitate
Binding agent, Fragrance
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR B Binding agentFragranceSkin conditioningEmollientAntistatic agentBindingPerfumingSolvent Bad for Oily SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Alpha-Isomethyl Ionone
Perfuming, Skin conditioning
Moderate-hazard ingredient.Read moreShow less
EWG 5 PerfumingSkin conditioning Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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