Pure Style Styling Mousse

Herbina

Pure Style Styling Mousse

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About this product

The Herbina Pure Style Styling Mousse is a misc. Our analysis of its 17 ingredients (13 low-risk) rates it Excellent (89/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
17
Low-risk
13
Fragrance
Fragrance-free
Origin
Finland

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/3
Good for dry skin
Betaine Glycerin Propylene Glycol
Caution for dry skin
Glycerin PVP Oleth-20
Oily/Acne-Prone Skin No data
Sensitive Skin 1/8
Good for sensitive skin
Glycerin
Caution for sensitive skin
Glycerin Propylene Glycol Citric Acid Oleth-20 Sorbic Acid Potassium Sorbate Phenoxyethanol Butane

Ingredients list

17 total
Lower hazard (1) Higher hazard (7)
All17 Fragrance7 Humectant6 Skin Conditioning6 Film Forming5 Hair Fixing4 Antistatic Agent4 Preservative3 Hair Conditioning3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
7
A
Butane
(Propellant)
4
A
Propane
(Propellant)
1
A
VP/VA Copolymer
(Binding, Film Forming, Hair Fixing)
1
A
Polyquaternium-11
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
PVP
(Binding Agent, Emulsion Stabilising, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding, Viscosity Controlling)
Eriophorum Spissum Flower/Stem Extract
(Skin Conditioning)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
2
B
Oleth-20
(Fragrance, Sufactant, Emulsifying, Surfactant)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
A
Potassium Sorbate
(Fragrance, Preservative)
3
A
Sorbic Acid
(Fragrance, Preservative)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Eriophorum Spissum Flower/Stem Extract
Skin Conditioning
Betaine
Humectant, Skin Conditioning
Panthenol
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Propylene Glycol
Humectant, Skin Conditioning
Ethylhexylglycerin
Skin Conditioning

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Reduces IrritationEases discomfort and supports skin resilience.
Scar HealingImproves the look of marks and scars.
Redness ReducingSoothes visible redness and calms irritation.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
Butane — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Propane
Propellant
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Propellant
VP/VA Copolymer
Binding, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A BindingFilm formingHair fixing
Polyquaternium-11
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
PVP
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingHair fixingSuspending agent - nonsurfactantAntistatic agentBindingViscosity controlling
Eriophorum Spissum Flower/Stem Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Oleth-20
Fragrance, Sufactant
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B FragranceSufactantEmulsifyingSurfactant
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Potassium Sorbate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Sorbic Acid
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Butane
Propellant
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Propellant
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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