Sensitive Muotovaahto

Herbina

Where to buy Possibly in stock

About this product

The Herbina Sensitive Muotovaahto is a misc. Our analysis of its 16 ingredients (11 low-risk) rates it Excellent (82/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
16
Low-risk
11
Fragrance
Fragrance-free
Origin
Finland

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/4
Good for dry skin
Betaine Camellia Sinensis Leaf Extract
Caution for dry skin
PVP Oleth-20 Camellia Sinensis Leaf Extract Polysorbate 20
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 1/6
Good for sensitive skin
Camellia Sinensis Leaf Extract
Caution for sensitive skin
Citric Acid Oleth-20 Camellia Sinensis Leaf Extract Phenoxyethanol Butane Isobutane

Ingredients list

16 total
Lower hazard (1) Higher hazard (7)
All16 Skin Conditioning6 Film Forming5 Hair Fixing4 Fragrance4 Antistatic Agent4 Propellant3 Surfactant3 Humectant3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
7
A
Butane
(Propellant)
4
A
Propane
(Propellant)
7
A
Isobutane
(Propellant)
1
A
VP/VA Copolymer
(Binding, Film Forming, Hair Fixing)
2
B
Oleth-20
(Fragrance, Sufactant, Emulsifying, Surfactant)
1
A
PVP
(Binding Agent, Emulsion Stabilising, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding, Viscosity Controlling)
1
A
Polyquaternium-11
(Antistatic Agent, Film Forming, Hair Fixing)
Helianthus Annuus Seed Oil
(Fragrance, Skin Conditioning, Skin Conditioning Emollient)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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No close formula match yet — browse other products like this

Key ingredients

Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Barrier RepairStrengthen and restore your skin's natural barrier.
Anti-AgingSoftens lines and helps skin look youthful.
BrighteningRestores radiance to dull, tired skin.
Good For Oily SkinBalances oil and helps reduce shine.
Reduces Large PoresMinimizes the look of enlarged pores.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
Butane — higher EWG
Isobutane — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Propane
Propellant
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Propellant
VP/VA Copolymer
Binding, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A BindingFilm formingHair fixing
Oleth-20
Fragrance, Sufactant
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B FragranceSufactantEmulsifyingSurfactant
PVP
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingHair fixingSuspending agent - nonsurfactantAntistatic agentBindingViscosity controlling
Polyquaternium-11
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Helianthus Annuus Seed Oil
Fragrance, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceSkin conditioningSkin conditioning emollient
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Butane
Propellant
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Propellant
Isobutane
Propellant
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Propellant
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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