Calm & Go Face Mist

Honest Beauty

Where to buy Possibly in stock

About this product

The Honest Beauty Calm & Go Face Mist is a toner. Our analysis of its 19 ingredients (17 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Toners
Ingredients
19
Low-risk
17
Fragrance
Fragrance-free
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/3
Good for dry skin
Linoleic Acid Orbignya Oleifera Seed Oil Squalane Caprylic/Capric Triglyceride Caprylyl Glycol
Caution for dry skin
Linoleic Acid Polyglyceryl-10 Laurate Hydrogenated Phosphatidylcholine
Oily/Acne-Prone Skin No data
Sensitive Skin 2/3
Good for sensitive skin
Hydroxyacetophenone Tocopheryl Acetate
Caution for sensitive skin
Linoleic Acid Caprylic/Capric Triglyceride Citric Acid

Ingredients list

19 total
Lower hazard (1) Higher hazard (3)
All19 Skin Conditioning19 Emollient5 Solvent4 Hair Conditioning4 Emulsifying2 Surfactant2 Antistatic Agent2 Chelating Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Polyglyceryl-10 Laurate
(Skin Conditioning, Emulsifying, Surfactant)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
A
Phytosterols
(Skin Conditioning)
1
A
Phospholipids
(Skin Conditioning)
Hydrolyzed Sodium Hyaluronate
(Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
BUTYROSPERMUM PARKII BUTTER EXTRACT
(Skin Conditioning)
1
A
Orbignya Oleifera Seed Oil
(Emollient)
1
A
Squalane
(Emollient, Hair Conditioning, Refatting, Skin Conditioning)
1
Trisodium Ethylenediamine Disuccinate
(Chelating Agent)
1
A
Caprylic/Capric Triglyceride
(Emollient, Masking, Perfuming, Skin Conditioning, Solvent)
1
Linoleic Acid
(Fragrance, Hair Conditioning, Skin Conditioning, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Linoleic Acid., Antistatic Agent, Emollient)
Fungal Acne
Fungal Acne Trigger
1
Hydroxyacetophenone
(Antioxidant)
1
A
Hydrogenated Phosphatidylcholine
(Skin Conditioning, Emulsifying, Surfactant)
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
A
1,2-Hexanediol
(Solvent)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Antioxidants
Shields skin from free radical damage.
Vitamin E
Protects skin and soothes irritation.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Reduces IrritationEases discomfort and supports skin resilience.
Scar HealingImproves the look of marks and scars.
Redness ReducingSoothes visible redness and calms irritation.
Anti-AgingSoftens lines and helps skin look youthful.
BrighteningRestores radiance to dull, tired skin.
Dark SpotsFades dark spots for even skin tone.

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Polyglyceryl-10 Laurate
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmulsifyingSurfactant
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Phytosterols
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioning
Phospholipids
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioning
Hydrolyzed Sodium Hyaluronate
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
BUTYROSPERMUM PARKII BUTTER EXTRACT
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Orbignya Oleifera Seed Oil
Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emollient
Squalane
Emollient, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientHair conditioningRefattingSkin conditioning
Trisodium Ethylenediamine Disuccinate
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Caprylic/Capric Triglyceride
Emollient, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientMaskingPerfumingSkin conditioningSolvent
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Hydrogenated Phosphatidylcholine
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningEmulsifyingSurfactant
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Linoleic Acid
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceHair conditioningSkin conditioningSufactantsurfactant-cleansing agent is included as a function for the soap form of linoleic acid.Antistatic agentEmollient Fungal-acne trigger
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Use right after cleansing, before serums.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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