Easy Bake Setting Spray

Huda Beauty

Where to buy Possibly in stock

About this product

The Huda Beauty Easy Bake Setting Spray is a misc. Our analysis of its 20 ingredients (18 low-risk) rates it Excellent (98/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
20
Low-risk
18
Fragrance
Fragrance-free
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 8/3
Good for dry skin
Saccharide Isomerate Sodium Hyaluronate Crosspolymer Ectoin Sodium Hyaluronate Glycerin Hydrolyzed Glycosaminoglycans Hydrolyzed Hyaluronic Acid Hyaluronic Acid
Caution for dry skin
Distarch Phosphate Magnesium Aluminum Silicate Glycerin
Oily/Acne-Prone Skin No data
Sensitive Skin 1/4
Good for sensitive skin
Glycerin
Caution for sensitive skin
Raspberry Ketone Glycerin Citric Acid Phenoxyethanol

Ingredients list

20 total
Lower hazard (1) Higher hazard (4)
All20 Skin Conditioning16 Humectant8 Solvent4 Hair Conditioning4 Fragrance4 Perfuming2 Masking2 Buffering Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Niacinamide
(Hair Conditioning, Skin Conditioning, Smoothing)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
A
Magnesium Aluminum Silicate
(Absorbent, Anticaking Agent, Opacifying, Slip Modifier, Viscosity Increasing Agent, Viscosity Controlling)
2
AMP-Acrylates/Allyl Methacrylate Copolymer
(Film Forming, Hair Fixing)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
Distarch Phosphate
(Anticaking Agent, Binding Agent, Absorbent, Binding)
1
Trisodium Ethylenediamine Disuccinate
(Chelating Agent)
1
Hydrolyzed Glycosaminoglycans
(Hair Conditioning, Skin Conditioning, Humectant)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
1
Ectoin
(Buffering Agent, Skin Conditioning, Emollient)
Benzyl Glycol
(Solvent)
1
A
Hyaluronic Acid
(Skin Conditioning, Viscosity Increasing Agent, Antistatic Agent, Humectant, Moisturising)
1
Hydrolyzed Hyaluronic Acid
(Hair Conditioning, Humectant, Skin Conditioning)
1
Sodium Hyaluronate Crosspolymer
(Humectant, Skin Conditioning)
1
Raspberry Ketone
(Fragrance, Skin Conditioning, Masking, Perfuming)
1
Saccharide Isomerate
(Humectant)

My Ingredient Notes

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Key ingredients

Hyaluronic Acid
Hydrates by attracting and holding water.
AHA
Exfoliates skin for a brighter complexion.
Niacinamide
Strengthens, smooths, and brightens skin.
Ectoin
Protects against environmental stress and aging.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Scar HealingImproves the look of marks and scars.
Anti-AgingSoftens lines and helps skin look youthful.
Redness ReducingSoothes visible redness and calms irritation.
BrighteningRestores radiance to dull, tired skin.
Reduces IrritationEases discomfort and supports skin resilience.
Good For Oily SkinBalances oil and helps reduce shine.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Niacinamide
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningSmoothing
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Magnesium Aluminum Silicate
Absorbent, Anticaking agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AbsorbentAnticaking agentOpacifyingSlip modifierViscosity increasing agentViscosity controlling
AMP-Acrylates/Allyl Methacrylate Copolymer
Film forming, Hair fixing
Low-hazard ingredient.Read moreShow less
EWG 2 Film formingHair fixing
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Distarch Phosphate
Anticaking agent, Binding agent
Low-hazard ingredient.Read moreShow less
EWG 1 Anticaking agentBinding agentAbsorbentBinding
Trisodium Ethylenediamine Disuccinate
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Hydrolyzed Glycosaminoglycans
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningSkin conditioningHumectant
Ectoin
Buffering agent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Buffering agentSkin conditioningEmollient
Benzyl Glycol
Solvent
Limited public safety data.Read moreShow less
EWG N/A Solvent
Hyaluronic Acid
Skin conditioning, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningViscosity increasing agentAntistatic agentHumectantMoisturising
Hydrolyzed Hyaluronic Acid
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningHumectantSkin conditioning
Sodium Hyaluronate Crosspolymer
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantSkin conditioning
Raspberry Ketone
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceSkin conditioningMaskingPerfuming
+ 1 more — see the full ingredients list above
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

Niacinamide 2–5% (up to 10%)

Most research uses 2–5%; some formulas go to 10%. Very high levels can cause flushing in sensitive skin.

Niacinamide

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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