Nanoblur Cream

Indeed Labs

Where to buy Possibly in stock

About this product

The Indeed Labs Nanoblur Cream is a moisturizer. Our analysis of its 16 ingredients (15 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Moisturizers
Ingredients
16
Low-risk
15
Fragrance
Fragrance-free
Origin
Canada

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 6/4
Good for dry skin
Isohexadecane Caprylyl Glycol Glycerin Cyclohexasiloxane Dimethicone Cyclopentasiloxane
Caution for dry skin
Sodium Acrylate/Sodium Acryloyldimethyl Taurate Copolymer Glycerin Hydroxypropyl Methylcellulose Polysorbate 80
Oily/Acne-Prone Skin No data
Sensitive Skin 2/3
Good for sensitive skin
Glycerin Dimethicone
Caution for sensitive skin
Glycerin Citric Acid Phenoxyethanol

Ingredients list

16 total
Lower hazard (1) Higher hazard (4)
All16 Skin Conditioning9 Solvent5 Film Forming5 Hair Conditioning5 Emollient5 Emulsion Stabilising3 Humectant3 Fragrance3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
Adipic Acid/Neopentyl Glycol Crosspolymer
(Anticaking Agent, Antiperspirant Agent, Binding, Bulking Agent, Deodorant, Viscosity Controlling)
3
A
Dimethicone
(Antifoaming Agent, Skin Protecting, Emollient, Skin Conditioning)
Silicone
Silicone
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
3
A
Cyclopentasiloxane
(Hair Conditioning, Skin Conditioning, Emollient, Solvent)
Silicone
Silicone
1
A
VP/VA Copolymer
(Binding, Film Forming, Hair Fixing)
2
A
Cyclohexasiloxane
(Hair Conditioning, Skin Conditioning, Emollient, Solvent)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Amodimethicone
(Antistatic Agent, Hair Conditioning)
Silicone
Silicone
1
A
Hydroxypropyl Methylcellulose
(Adhesive, Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Antistatic Agent, Binding, Surfactant, Viscosity Controlling)
1
Sodium Acrylate/Sodium Acryloyldimethyl Taurate Copolymer
(Anticaking Agent, Emulsion Stabilising, Opacifying, Suspending Agent Nonsurfactant, Viscosity Increasing Agent)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
1
B
Isohexadecane
(Skin Conditioning, Emollient, Solvent)
1
Polysilicone-11
(Film Forming)
3
B
Polysorbate 80
(Denaturant, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Dimethicone
Skin Protecting, Emollient
Glycerin
Humectant, Skin Protecting
Cyclopentasiloxane
Skin Conditioning, Emollient
Cyclohexasiloxane
Skin Conditioning, Emollient
Caprylyl Glycol
Skin Conditioning, Emollient
Isohexadecane
Skin Conditioning, Emollient

Benefits

Scar HealingImproves the look of marks and scars.
HydratingBoosts hydration and relieves dry, tight skin.
Good For Oily SkinBalances oil and helps reduce shine.
Barrier RepairStrengthen and restore your skin's natural barrier.

Concerns

Contains paraben
Contains silicone
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Adipic Acid/Neopentyl Glycol Crosspolymer
Anticaking agent, Antiperspirant agent
Low-hazard ingredient.Read moreShow less
EWG 1 Anticaking agentAntiperspirant agentBindingBulking agentDeodorantViscosity controlling
VP/VA Copolymer
Binding, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A BindingFilm formingHair fixing
Cyclohexasiloxane
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Hair conditioningSkin conditioningEmollientSolvent
Hydroxypropyl Methylcellulose
Adhesive, Binding agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AdhesiveBinding agentEmulsion stabilisingFilm formingViscosity increasing agentAntistatic agentBindingSurfactantViscosity controlling
Sodium Acrylate/Sodium Acryloyldimethyl Taurate Copolymer
Anticaking agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 Anticaking agentEmulsion stabilisingOpacifyingSuspending agent - nonsurfactantViscosity increasing agent
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
Isohexadecane
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollientSolvent
Polysilicone-11
Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Film forming
Dimethicone
Antifoaming agent, Skin protecting
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antifoaming agentSkin protectingEmollientSkin conditioning Silicone
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Cyclopentasiloxane
Hair conditioning, Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Hair conditioningSkin conditioningEmollientSolvent Silicone
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Amodimethicone
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning Silicone
Polysorbate 80
Denaturant, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantEmulsifyingSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Apply near the end of your routine, after thinner serums.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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