Forest For Men Moisture Shaving & Cleansing Foam

INNISFREE

Forest For Men Moisture Shaving & Cleansing Foam

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About this product

The INNISFREE Forest For Men Moisture Shaving & Cleansing Foam is a emulsion. Our analysis of its 31 ingredients (25 low-risk) rates it Excellent (92/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
31
Low-risk
25
Fragrance
Contains fragrance

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Cruelty-Free

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 8/7
Good for dry skin
Glyceryl Stearate Sorbitol Butylene Glycol Glycerin Camellia Sinensis Leaf Extract PEG-32 PEG-8 Cryptomeria Japonica Leaf Extract
Caution for dry skin
Lauric Acid Sodium Methyl Cocoyl Taurate Stearic Acid Glycerin Camellia Sinensis Leaf Extract PEG-100 Stearate Triethanolamine
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 3/14
Good for sensitive skin
Glycerin Pinus Pinaster Bark/Bud Extract Camellia Sinensis Leaf Extract
Caution for sensitive skin
Citrus Unshiu Peel Extract Cinnamomum Camphora (Camphor) Leaf Extract Lauric Acid Myristic Acid Sorbitol Stearic Acid Butylene Glycol Glycerin Chamaecyparis Obtusa Water Camellia Sinensis Leaf Extract Sodium Benzoate Phenoxyethanol Triethanolamine Fragrance

Ingredients list

31 total
Lower hazard (1) Higher hazard (8)
All31 Skin Conditioning11 Fragrance11 Humectant9 Masking8 Solvent5 Emulsifying5 Perfuming4 Oral Care Agent3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
B
Citrus Unshiu Peel Extract
(Masking)
1
A
Glyceryl Stearate
(Emollient, Emulsifying)
Fungal Acne
Fungal Acne Trigger
1
Orchid Extract
(Skin Conditioning)
1
Cinnamomum Camphora (Camphor) Leaf Extract
(Fragrance, Perfuming)
1
Camellia Japonica Leaf Extract
(Skin Conditioning)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
A
Lauric Acid
(Fragrance, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Lauric Acid., Emulsifying)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
1
A
Myristic Acid
(Fragrance, Opacifying, Sufactant, Emulsifying, Perfuming)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Sorbitol
(Flavoring Agent, Fragrance, Humectant, Plasticizer, Skin Conditioning)
1
A
Stearic Acid
(Fragrance, Sufactant, Emulsifying, Surfactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Stearic Acid., Emulsion Stabilising, Masking, Refatting)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
Water
(Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Pinus Pinaster Bark/Bud Extract
(Antidandruff Agent, Antimicrobial, Antioxidant, Oral Care Agent, Skin Conditioning, Uv Absorber)
1
Chamaecyparis Obtusa Water
(Fragrance, Masking)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
3
B
Potassium Hydroxide
(Ph Adjuster, Buffering Agent)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
3
A
PEG-100 Stearate
(Surfactant)
Fungal Acne
Fungal Acne Trigger
3
A
PEG-14M
(Binding Agent, Emulsion Stabilising, Viscosity Increasing Agent)
3
A
PEG-32
(Binding Agent, Humectant, Solvent)
3
A
PEG-8
(Humectant, Solvent)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
5
B
Triethanolamine
(Fragrance, Ph Adjuster, Emulsifying, Surfactant, Buffering Agent, Masking)
8
Fragrance
(Deodorant, Masking, Perfuming)
Opuntia Coccinellifera Fruit Extract
(Skin Conditioning)
Cryptomeria Japonica Leaf Extract
(Humectant)

My Ingredient Notes

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Key ingredients

Glyceryl Stearate
Emollient
Orchid Extract
Skin Conditioning
Camellia Japonica Leaf Extract
Skin Conditioning
Sorbitol
Humectant, Skin Conditioning
Ethylhexylglycerin
Skin Conditioning
Butylene Glycol
Skin Conditioning, Humectant

Benefits

Good for dry skin
Good for oily/acne-prone skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
Fragrance — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Citrus Unshiu Peel Extract
Masking
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Masking
Orchid Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Cinnamomum Camphora (Camphor) Leaf Extract
Fragrance, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 1 FragrancePerfuming
Camellia Japonica Leaf Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Sorbitol
Flavoring agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 Flavoring agentFragranceHumectantPlasticizerSkin conditioning
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Pinus Pinaster Bark/Bud Extract
Antidandruff agent, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 1 Antidandruff agentAntimicrobialAntioxidantOral care agentSkin conditioningUv absorber
Chamaecyparis Obtusa Water
Fragrance, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceMasking
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Potassium Hydroxide
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Ph adjusterBuffering agent
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
PEG-14M
Binding agent, Emulsion stabilising
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Binding agentEmulsion stabilisingViscosity increasing agent
PEG-32
Binding agent, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Binding agentHumectantSolvent
+ 4 more — see the full ingredients list above
Glyceryl Stearate
Emollient, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientEmulsifying Fungal-acne trigger
Lauric Acid
Fragrance, Sufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.Emulsifying Bad for Oily SkinFungal-acne trigger
Myristic Acid
Fragrance, Opacifying
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceOpacifyingSufactantEmulsifyingPerfuming Bad for Oily SkinFungal-acne trigger
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Stearic Acid
Fragrance, Sufactant
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSufactantEmulsifyingSurfactantsurfactant-cleansing agent is included as a function for the soap form of stearic acid.Emulsion stabilisingMaskingRefatting Bad for Oily SkinFungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
PEG-100 Stearate
Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Surfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Triethanolamine
Fragrance, Ph adjuster
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR B FragrancePh adjusterEmulsifyingSurfactantBuffering agentMasking
Fragrance
Deodorant, Masking
Higher-hazard ingredient.Read moreShow less
EWG 8 DeodorantMaskingPerfuming

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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