Sukoyaka Suhada Urea Moisture Face Cream

Ishizawa Labs

Sukoyaka Suhada Urea Moisture Face Cream

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About this product

The Ishizawa Labs Sukoyaka Suhada Urea Moisture Face Cream is a moisturizer. Our analysis of its 28 ingredients (25 low-risk) rates it Excellent (98/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Moisturizers
Ingredients
28
Low-risk
25
Fragrance
Fragrance-free
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 12/5
Good for dry skin
Diphenyl Dimethicone Sodium Acetylated Hyaluronate Stearyl Dimethicone Butylene Glycol Sodium Hyaluronate Glycerin Triethylhexanoin Hydroxyethyl Urea Cyclohexasiloxane Cyclopentasiloxane Urea Lecithin
Caution for dry skin
Isostearic Acid Glycerin Polyglyceryl-10 Myristate Polyglyceryl-10 Stearate Lecithin
Oily/Acne-Prone Skin No data
Sensitive Skin 2/8
Good for sensitive skin
Glycerin Triethyl Citrate
Caution for sensitive skin
Dipropylene Glycol Arginine Butylene Glycol Glycerin Triethyl Citrate Triethylhexanoin Citric Acid Phenoxyethanol

Ingredients list

28 total
Lower hazard (1) Higher hazard (4)
All28 Skin Conditioning25 Solvent8 Fragrance8 Hair Conditioning8 Humectant8 Emulsifying6 Masking6 Emollient6
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
2
A
Cyclohexasiloxane
(Hair Conditioning, Skin Conditioning, Emollient, Solvent)
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
1
B
Polyglyceryl-10 Stearate
(Skin Conditioning, Emulsifying, Surfactant)
1
Hydroxyethyl Urea
(Hair Conditioning, Humectant, Skin Conditioning)
3
A
Urea
(Buffering Agent, Humectant, Antistatic Agent, Skin Conditioning)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
1
Sodium Acetylated Hyaluronate
(Humectant)
1
Ceramide NP
(Hair Conditioning, Skin Conditioning)
Hydrolyzed Soybean Extract
(Skin Conditioning)
Polyglyceryl-10 Behenate/Eicosadioate
(Emulsifying, Skin Conditioning)
1
A
Isostearic Acid
(Binding Agent, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Isostearic Acid., Binding, Emulsifying)
Fungal Acne
Fungal Acne Trigger
1
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
(Emulsion Stabilising, Film Forming, Viscosity Controlling)
1
Polymethylsilsesquioxane
(Opacifying)
3
A
Cyclopentasiloxane
(Hair Conditioning, Skin Conditioning, Emollient, Solvent)
Silicone
Silicone
3
6-Aminocaproic Acid
(Not Reported)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Triethylhexanoin
(Fragrance, Hair Conditioning, Antistatic Agent, Emollient, Masking, Refatting, Skin Conditioning, Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
2
3
Lecithin
(Skin Conditioning, Emulsifying, Surfactant, Antistatic Agent, Emollient)
1
Hexanoyl Dipeptide-3 Norleucine Acetate
(Skin Conditioning)
1
Polyglyceryl-10 Myristate
(Skin Conditioning, Emulsifying, Surfactant)
1
A
Triethyl Citrate
(Fragrance, Plasticizer, Antioxidant, Deodorant, Masking, Solvent)
1
A
Stearyl Dimethicone
(Emollient, Skin Conditioning)
Silicone
Silicone
1
Diphenyl Dimethicone
(Antifoaming Agent, Emollient, Emulsifying, Hair Conditioning, Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Hyaluronic Acid
Hydrates by attracting and holding water.
Ceramides
Locks in moisture and supports skin barrier.
Peptides
Supports skin hydration and improves firmness.
Urea
Gently exfoliates and deeply moisturizes.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Barrier RepairStrengthen and restore your skin's natural barrier.
Anti-AgingSoftens lines and helps skin look youthful.
Redness ReducingSoothes visible redness and calms irritation.
Scar HealingImproves the look of marks and scars.
Reduces IrritationEases discomfort and supports skin resilience.
Skin TextureSmooths rough patches and refines texture.
Show all 7 benefits

Concerns

Contains paraben
Contains silicone
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cyclohexasiloxane
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Hair conditioningSkin conditioningEmollientSolvent
Dipropylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentMaskingViscosity controlling
Polyglyceryl-10 Stearate
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmulsifyingSurfactant
Hydroxyethyl Urea
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningHumectantSkin conditioning
Urea
Buffering agent, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Buffering agentHumectantAntistatic agentSkin conditioning
Sodium Acetylated Hyaluronate
Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Humectant
Ceramide NP
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningSkin conditioning
Hydrolyzed Soybean Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Polyglyceryl-10 Behenate/Eicosadioate
Emulsifying, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A EmulsifyingSkin conditioning
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
Emulsion stabilising, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Emulsion stabilisingFilm formingViscosity controlling
Polymethylsilsesquioxane
Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 Opacifying
6-Aminocaproic Acid
Not reported
Low-to-moderate hazard.Read moreShow less
EWG 3 Not reported
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Triethylhexanoin
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningAntistatic agentEmollientMaskingRefattingSkin conditioningSolvent
+ 5 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Isostearic Acid
Binding agent, Sufactantsurfactant-cleansing agent is included as a function for the soap form of isostearic acid.
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentSufactantsurfactant-cleansing agent is included as a function for the soap form of isostearic acid.BindingEmulsifying Fungal-acne trigger
Cyclopentasiloxane
Hair conditioning, Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Hair conditioningSkin conditioningEmollientSolvent Silicone
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Stearyl Dimethicone
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientSkin conditioning Silicone
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Where it fits: Apply near the end of your routine, after thinner serums.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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