Centella Calming Daily Sun Water SPF 50+

Iunik

Centella Calming Daily Sun Water SPF 50+

Iunik

US
Sunscreen
0.0
from 0 Ratings
Where to buy Possibly in stock
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About this product

The Iunik Centella Calming Daily Sun Water SPF 50+ is a sunscreen. Our analysis of its 37 ingredients (28 low-risk) rates it Excellent (96/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sunscreen
Ingredients
37
Low-risk
28
Fragrance
Fragrance-free
Origin
South Korea
SPF
50 · blocks 98.0% UVB

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/7
Good for dry skin
Pueraria Lobata Root Extract Butylene Glycol Glycerin Hydrolyzed Hyaluronic Acid Dibutyl Adipate
Caution for dry skin
Microcrystalline Cellulose Sodium Stearoyl Glutamate Sorbitan Olivate Glycerin Hydrogenated Lecithin Quercus Acutissima Fruit Extract Anastatica Hierochuntica Extract
Oily/Acne-Prone Skin 2/0
Good for oily/acne-prone skin
Quercus Acutissima Fruit Extract Anastatica Hierochuntica Extract
Sensitive Skin 4/7
Good for sensitive skin
Madecassoside Asiaticoside Glycerin Allantoin
Caution for sensitive skin
Dipropylene Glycol Cellulose Gum Asiaticoside Butylene Glycol Glycerin Tromethamine Butane

Ingredients list

37 total
Lower hazard (1) Higher hazard (7)
All37 Skin Conditioning29 Solvent7 Hair Conditioning6 Uv Absorber5 Uv Filter5 Fragrance5 Humectant5 Masking4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
B
Centella Asiatica Leaf Water
(Skin Conditioning)
4
Ethylhexyl Salicylate
(Uv Absorber, Uv Filter)
3
Phenylbenzimidazole Sulfonic Acid
(Uv Absorber, Uv Filter)
2
Diethylamino Hydroxybenzoyl Hexyl Benzoate
(Uv Absorber, Uv Filter)
1
B
Butyloctyl Salicylate
(Hair Conditioning, Skin Conditioning, Solvent)
2
A
Tromethamine
(Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine
(Skin Conditioning, Uv Absorber, Uv Filter)
1
A
Dibutyl Adipate
(Plasticizer, Skin Conditioning, Emollient, Solvent, Film Forming)
7
A
Butane
(Propellant)
Terephthalylidene Dicamphor Sulfonic Acid
(Uv Absorber, Uv Filter)
1
A
1,2-Hexanediol
(Solvent)
1
Trimethylpentanediol/Adipic Acid/Glycerin Crosspolymer
(Skin Conditioning)
1
A
Microcrystalline Cellulose
(Abrasive, Absorbent, Anticaking Agent, Bulking Agent, Emulsion Stabilising, Slip Modifier, Viscosity Increasing Agent)
1
B
Sodium Stearoyl Glutamate
(Hair Conditioning, Skin Conditioning, Surfactant Cleansingagent, Emulsifying)
1
Polyester-5
(Film Forming, Viscosity Controlling)
1
A
Cellulose Gum
(Binding Agent, Emulsion Stabilising, Film Forming, Fragrance, Viscosity Increasing Agent, Binding, Masking, Viscosity Controlling)
1
A
Allantoin
(Skin Conditioning, Skin Protecting, Soothing) 		Good for Oily Skin
Good for Oily Skin
 Good for Sensitive Skin
Good for Sensitive Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling) 		Good for Dry Skin
Good for Dry Skin
Quercus Acutissima Fruit Extract
(Astringent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent) 		Good for Dry Skin
Good for Dry Skin
 Fungal Acne
Fungal Acne Trigger
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning) 		Good for Dry Skin
Good for Dry Skin
2
A
Hydrogenated Lecithin
(Skin Conditioning, Emulsifying, Surfactant, Suspending Agent Nonsurfactant)
1
B
Cetearyl Olivate
(Hair Conditioning)
1
A
Sorbitan Olivate
(Emulsifying, Surfactant) 		Fungal Acne
Fungal Acne Trigger
Anastatica Hierochuntica Extract
(Astringent, Skin Conditioning)
1
Hydrolyzed Hyaluronic Acid
(Hair Conditioning, Humectant, Skin Conditioning)
1
Madecassoside
(Antioxidant, Skin Conditioning)
Ulmus Davidiana Root Extract
(Skin Conditioning)
2
Pinus Palustris Leaf Extract
(Tonic)
Oenothera Biennis Flower Extract
(Astringent)
1
Pueraria Lobata Root Extract
(Humectant)
1
Asiaticoside
(Antioxidant, Skin Conditioning, Perfuming)
1
Madecassic Acid
(Skin Conditioning)
1
Asiatic Acid
(Skin Conditioning, Stabilising)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Concentration unknown. Ingredient lists don't reveal how much of each ingredient is used — so hazard and benefit can't be judged exactly. How we score →

Key ingredients

Chemical UV Filter
Absorbs UV rays to help prevent sun damage.
Antioxidants
Shields skin from free radical damage.
Hyaluronic Acid
Hydrates by attracting and holding water.

Benefits

Barrier RepairStrengthen and restore your skin's natural barrier.
HydratingBoosts hydration and relieves dry, tight skin.
Scar HealingImproves the look of marks and scars.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Anti-AgingSoftens lines and helps skin look youthful.
Skin TextureSmooths rough patches and refines texture.
Show all 7 benefits

Concerns

Not fungal acne (malassezia) safe
Butane — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Centella Asiatica Leaf Water
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A CIR B Skin conditioning
Ethylhexyl Salicylate
Uv absorber, Uv filter
Low-to-moderate hazard.Read moreShow less
EWG 4 Uv absorberUv filter
Phenylbenzimidazole Sulfonic Acid
Uv absorber, Uv filter
Low-to-moderate hazard.Read moreShow less
EWG 3 Uv absorberUv filter
Diethylamino Hydroxybenzoyl Hexyl Benzoate
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 2 Uv absorberUv filter
Butyloctyl Salicylate
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningSolvent
Tromethamine
Fragrance, Ph adjuster
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A FragrancePh adjusterBuffering agentMasking
Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine
Skin conditioning, Uv absorber
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningUv absorberUv filter
Dibutyl Adipate
Plasticizer, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A PlasticizerSkin conditioningEmollientSolventFilm forming
Terephthalylidene Dicamphor Sulfonic Acid
Uv absorber, Uv filter
Limited public safety data.Read moreShow less
EWG N/A Uv absorberUv filter
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Trimethylpentanediol/Adipic Acid/Glycerin Crosspolymer
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Microcrystalline Cellulose
Abrasive, Absorbent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AbrasiveAbsorbentAnticaking agentBulking agentEmulsion stabilisingSlip modifierViscosity increasing agent
Sodium Stearoyl Glutamate
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningSurfactant - cleansingagentEmulsifying
Polyester-5
Film forming, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingViscosity controlling
+ 16 more — see the full ingredients list above
Butane
Propellant
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Propellant
Allantoin
Skin conditioning, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSkin protectingSoothing Good for Oily SkinGood for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Sorbitan Olivate
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmulsifyingSurfactant Fungal-acne trigger

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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Iunik
United States · 34 products

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