Free Mark Zero-G Hydra Sun Mist SPF40 PA+++

Jaminkyung

Free Mark Zero-G Hydra Sun Mist SPF40 PA+++

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About this product

The Jaminkyung Free Mark Zero-G Hydra Sun Mist SPF40 PA+++ is a sunscreen. Our analysis of its 36 ingredients (26 low-risk) rates it Excellent (91/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sunscreen
Ingredients
36
Low-risk
26
Fragrance
Contains fragrance
Origin
South Korea
SPF
40 · blocks 97.5% UVB · PA+++

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 7/5
Good for dry skin
Squalane Octyldodecanol Isododecane Caprylic/Capric Triglyceride Caprylyl Glycol Butylene Glycol Glycerin
Caution for dry skin
Centella Asiatica Extract Glycerin Polyglyceryl-10 Oleate Hydrogenated Lecithin Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 5/16
Good for sensitive skin
Madecassoside Centella Asiatica Extract Asiaticoside Glycerin Eucommia Ulmoides Bark Extract
Caution for sensitive skin
Dipropylene Glycol Methyl Diisopropyl Propionamide Menthyl Lactate Asiaticoside Ethyl Menthane Carboxamide Octyldodecanol Isododecane Caprylic/Capric Triglyceride Butylene Glycol Glycerin Alcohol Denat. Homosalate Linalool Citronellol Alpha-Isomethyl Ionone Hexyl Cinnamal

Ingredients list

36 total
Lower hazard (1) Higher hazard (5)
All36 Skin Conditioning26 Fragrance14 Masking9 Solvent9 Perfuming7 Uv Absorber6 Hair Conditioning5 Emollient5
EWG CIR Ingredient Name & Cosmetic Functions Notes
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
4
Homosalate
(Fragrance, Sunscreen Agent, Uv Absorber, Skin Conditioning, Uv Filter)
3
Octocrylene
(Sunscreen Agent, Uv Absorber, Uv Filter)
1
B
Isododecane
(Fragrance, Solvent, Emollient, Perfuming)
4
Ethylhexyl Salicylate
(Uv Absorber, Uv Filter)
1
Water
(Solvent)
2
Butyl Methoxydibenzoylmethane
(Uv Absorber, Uv Filter)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
Ethylhexyl Triazone
(Uv Absorber, Uv Filter)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
1
Madecassoside
(Antioxidant, Skin Conditioning)
1
Asiaticoside
(Antioxidant, Skin Conditioning, Perfuming)
1
Asiatic Acid
(Skin Conditioning, Stabilising)
1
Madecassic Acid
(Skin Conditioning)
1
A
Squalane
(Emollient, Hair Conditioning, Refatting, Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
Ceramide NP
(Hair Conditioning, Skin Conditioning)
Eucommia Ulmoides Bark Extract
(Antioxidant, Skin Protecting)
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Bisabolol
(Fragrance, Skin Conditioning, Soothing)
1
A
Caprylic/Capric Triglyceride
(Emollient, Masking, Perfuming, Skin Conditioning, Solvent)
2
A
Hydrogenated Lecithin
(Skin Conditioning, Emulsifying, Surfactant, Suspending Agent Nonsurfactant)
1
B
Polyglyceryl-10 Oleate
(Skin Conditioning, Emulsifying, Surfactant)
1
Menthyl Lactate
(Flavoring Agent, Fragrance, Masking, Refreshing)
1
Ethyl Menthane Carboxamide
(Flavoring Agent, Fragrance, Tonic)
1
Methyl Diisopropyl Propionamide
(Fragrance, Masking)
1
Adenosine
(Skin Conditioning)
1
A
Octyldodecanol
(Fragrance, Skin Conditioning, Emollient, Perfuming, Solvent)
1
A
1,2-Hexanediol
(Solvent)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
PARFUM
(Fragrance, Perfuming)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
5
Alpha-Isomethyl Ionone
(Perfuming, Skin Conditioning)
Allergens
Allergens

My Ingredient Notes

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Key ingredients

Chemical UV Filter
Absorbs UV rays to help prevent sun damage.
Antioxidants
Shields skin from free radical damage.
Ceramides
Locks in moisture and supports skin barrier.

Benefits

Barrier RepairStrengthen and restore your skin's natural barrier.
HydratingBoosts hydration and relieves dry, tight skin.
Scar HealingImproves the look of marks and scars.
Anti-AgingSoftens lines and helps skin look youthful.
Reduces IrritationEases discomfort and supports skin resilience.
Redness ReducingSoothes visible redness and calms irritation.
Skin TextureSmooths rough patches and refines texture.
Show all 7 benefits

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Homosalate
Fragrance, Sunscreen agent
Low-to-moderate hazard.Read moreShow less
EWG 4 FragranceSunscreen agentUv absorberSkin conditioningUv filter
Octocrylene
Sunscreen agent, Uv absorber
Low-to-moderate hazard.Read moreShow less
EWG 3 Sunscreen agentUv absorberUv filter
Isododecane
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceSolventEmollientPerfuming
Ethylhexyl Salicylate
Uv absorber, Uv filter
Low-to-moderate hazard.Read moreShow less
EWG 4 Uv absorberUv filter
Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Butyl Methoxydibenzoylmethane
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 2 Uv absorberUv filter
Ethylhexyl Triazone
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 1 Uv absorberUv filter
Centella Asiatica Extract
Cleansing, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSkin conditioningSmoothingSoothingTonic
Madecassoside
Antioxidant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 AntioxidantSkin conditioning
Asiaticoside
Antioxidant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 AntioxidantSkin conditioningPerfuming
Asiatic Acid
Skin conditioning, Stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningStabilising
Madecassic Acid
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Squalane
Emollient, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientHair conditioningRefattingSkin conditioning
Ceramide NP
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningSkin conditioning
Eucommia Ulmoides Bark Extract
Antioxidant, Skin protecting
Limited public safety data.Read moreShow less
EWG N/A AntioxidantSkin protecting
+ 13 more — see the full ingredients list above
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Alpha-Isomethyl Ionone
Perfuming, Skin conditioning
Moderate-hazard ingredient.Read moreShow less
EWG 5 PerfumingSkin conditioning Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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