Jan Marini Skin Research, Inc. C-ESTA Cleansing Gel

Jan Marini Skin Research, Inc.

Jan Marini Skin Research, Inc. C-ESTA Cleansing Gel

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About this product

The Jan Marini Skin Research, Inc. C-ESTA Cleansing Gel is a cleanser. Our analysis of its 26 ingredients (14 low-risk) rates it Great (74/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
26
Low-risk
14
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/6
Good for dry skin
Butylene Glycol Glycerin Quillaja Saponaria Bark Extract
Caution for dry skin
Lauramine Oxide Ammonium Lauryl Sulfate Glycerin Quillaja Saponaria Bark Extract Polysorbate 20 Ammonium Laureth Sulfate
Oily/Acne-Prone Skin No data
Sensitive Skin 3/13
Good for sensitive skin
Ascorbyl Palmitate Glycerin Sodium Metabisulfite
Caution for sensitive skin
Lauramine Oxide Ascorbyl Palmitate Butylene Glycol Glycerin Quillaja Saponaria Bark Extract Citric Acid Methylparaben Ethylparaben Phenoxyethanol Butylparaben Isobutylparaben Propylparaben Fragrance

Ingredients list

26 total
Lower hazard (1) Higher hazard (8)
All26 Fragrance9 Preservative7 Masking6 Skin Conditioning6 Perfuming4 Surfactant4 Antistatic Agent4 Hair Conditioning4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Ammonium Lauryl Sulfate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
2
3
Ammonium Laureth Sulfate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
3
A
PEG-120 Methyl Glucose Dioleate
(Sufactant, Emulsifying)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Quillaja Saponaria Bark Extract
(Antidandruff Agent, Cleansing, Emulsifying, Foaming, Masking, Moisturising, Skin Conditioning, Surfactant)
Saponaria Officinalis Root Extract
(Skin Conditioning)
Yucca Schidigera Root Extract
(Skin Conditioning)
1
Laurdimonium Hydroxypropyl Hydrolyzed Wheat Protein
(Antistatic Agent, Hair Conditioning)
4
A
Sodium Metabisulfite
(Antioxidant, Preservative, Reducing)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Ascorbyl Palmitate
(Antioxidant, Masking)
Fungal Acne
Fungal Acne Trigger
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Lauramine Oxide
(Fragrance, Hair Conditioning, Sufactant, Surfactant Foam Booster, Hydrotrope, Antistatic Agent, Foam Boosting, Perfuming, Viscosity Controlling)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
4
Dimethyl MEA
(Ph Adjuster, Buffering Agent)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
4
A
Methylparaben
(Fragrance, Preservative)
Paraben
Paraben
4
A
Ethylparaben
(Fragrance, Preservative)
Paraben
Paraben
7
A
Butylparaben
(Fragrance, Preservative, Masking)
Paraben
Paraben
7
A
Propylparaben
(Fragrance, Preservative, Perfuming)
Paraben
Paraben
7
A
Isobutylparaben
(Preservative)
Paraben
Paraben
8
Fragrance
(Deodorant, Masking, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Quillaja Saponaria Bark Extract
Moisturising, Skin Conditioning
Saponaria Officinalis Root Extract
Skin Conditioning
Yucca Schidigera Root Extract
Skin Conditioning
Sodium Metabisulfite
Antioxidant

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains sulfate
Not fungal acne (malassezia) safe
Butylparaben — higher EWG
Propylparaben — higher EWG
Isobutylparaben — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
PEG-120 Methyl Glucose Dioleate
Sufactant, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A SufactantEmulsifying
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Quillaja Saponaria Bark Extract
Antidandruff agent, Cleansing
Low-hazard ingredient.Read moreShow less
EWG 1 Antidandruff agentCleansingEmulsifyingFoamingMaskingMoisturisingSkin conditioningSurfactant
Saponaria Officinalis Root Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Yucca Schidigera Root Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Laurdimonium Hydroxypropyl Hydrolyzed Wheat Protein
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
Sodium Metabisulfite
Antioxidant, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A AntioxidantPreservativeReducing
Lauramine Oxide
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceHair conditioningSufactantSurfactant -foam boosterHydrotropeAntistatic agentFoam boostingPerfumingViscosity controlling
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Dimethyl MEA
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 4 Ph adjusterBuffering agent
Ammonium Lauryl Sulfate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Sulfate
Ammonium Laureth Sulfate
Cleansing, Foaming
Low-to-moderate hazard.Read moreShow less
EWG 2–3 CleansingFoamingSurfactant Sulfate
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Ascorbyl Palmitate
Antioxidant, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AntioxidantMasking Fungal-acne trigger
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Methylparaben
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Ethylparaben
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Butylparaben
Fragrance, Preservative
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A FragrancePreservativeMasking Paraben
Propylparaben
Fragrance, Preservative
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A FragrancePreservativePerfuming Paraben
Isobutylparaben
Preservative
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Preservative Paraben
Fragrance
Deodorant, Masking
Higher-hazard ingredient.Read moreShow less
EWG 8 DeodorantMaskingPerfuming

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

Vitamin C (ascorbic) 5–20%

L-ascorbic acid is usually used at 5–20% (around 10–15% is common). Above ~20% adds little and tends to irritate more; it also needs a low pH to work.

Ascorbyl Palmitate

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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