Enriched Pro Skin Core Mask

JMsolution

Enriched Pro Skin Core Mask

JMsolution

US
Sheet Mask
0.0
from 0 Ratings
Where to buy Possibly in stock
Search on Amazon ships from United States

About this product

The JMsolution Enriched Pro Skin Core Mask is a sheet mask. Our analysis of its 34 ingredients (29 low-risk) rates it Excellent (99/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sheet Mask
Ingredients
34
Low-risk
29
Fragrance
Contains fragrance
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 9/6
Good for dry skin
Glycereth-26 Betaine Sucrose Sodium Hyaluronate Glycerin Hydroxyethyl Urea Saccharomyces Ferment Filtrate Camellia Sinensis Leaf Extract Galactomyces Ferment Filtrate
Caution for dry skin
Xanthan Gum Glycerin Camellia Sinensis Leaf Extract Polysorbate 20 Polysorbate 60 Silica
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 4/5
Good for sensitive skin
Sucrose Glycerin Camellia Sinensis Leaf Extract Allantoin
Caution for sensitive skin
Disodium Phosphate Arginine Glycerin Camellia Sinensis Leaf Extract Phenoxyethanol

Ingredients list

34 total
Lower hazard (1) Higher hazard (4)
All34 Skin Conditioning21 Humectant12 Viscosity Controlling7 Emulsion Stabilising6 Solvent5 Fragrance5 Hair Conditioning5 Skin Protecting4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent) 		Good for Dry Skin
Good for Dry Skin
 Fungal Acne
Fungal Acne Trigger
3
PEG/PPG-17/6 Copolymer
(Solvent)
1
Glycereth-26
(Humectant, Viscosity Decreasing Agent, Solvent, Viscosity Controlling)
1
A
Carbomer
(Emulsion Stabilising, Viscosity Increasing Agent, Gel Forming, Viscosity Controlling)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Allantoin
(Skin Conditioning, Skin Protecting, Soothing) 		Good for Oily Skin
Good for Oily Skin
 Good for Sensitive Skin
Good for Sensitive Skin
1
Hydroxyethyl Urea
(Hair Conditioning, Humectant, Skin Conditioning)
3
B
Polysorbate 20
(Emulsifying, Surfactant) 		Fungal Acne
Fungal Acne Trigger
1
A
Xanthan Gum
(Binding Agent, Emulsion Stabilising, Skin Conditioning, Surfactant Emulsifying Agent, Viscosity Increasing Agent, Binding, Gel Forming, Viscosity Controlling)
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning) 		Good for Dry Skin
Good for Dry Skin
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant) 		Good for Dry Skin
Good for Dry Skin
1
Lactobacillus Ferment Lysate
(Skin Conditioning)
3
B
Polysorbate 60
(Emulsifying, Surfactant) 		Fungal Acne
Fungal Acne Trigger
1
B
Disodium Phosphate
(Buffering Agent, Anticorrosive, Fragrance, Ph Adjuster, Masking)
1
A
Sucrose
(Flavoring Agent, Humectant, Skin Conditioning, Soothing)
1
B
Sodium Phosphate
(Buffering Agent)
1
Saccharomyces Ferment Filtrate
(Humectant)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber) 		Good for Oily Skin
Good for Oily Skin
1
Carica Papaya (Papaya) Fruit Extract
(Skin Conditioning)
Ananas Sativus Fruit Extract
(Skin Conditioning)
Ficus Carica Fruit Extract
(Humectant)
Galactomyces Ferment Filtrate
(Humectant) 		Fungal Acne
Fungal Acne Trigger
1
2
A
Silica
(Abrasive, Absorbent, Anticaking Agent, Bulking Agent, Opacifying, Viscosity Controlling)
1
Protease
(Lytic Agent, Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative) 		Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
A
1,2-Hexanediol
(Solvent)
PARFUM
(Fragrance, Perfuming)
2
CI 42090
(Colorant, Cosmetic Colorant)
2
CI 17200
(Cosmetic Colorant)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

Browse similar sheet mask
No close formula match yet — browse other products like this
Concentration unknown. Ingredient lists don't reveal how much of each ingredient is used — so hazard and benefit can't be judged exactly. How we score →

Key ingredients

Exfoliators
Removes dead skin cells to smoothe texture.
Hyaluronic Acid
Hydrates by attracting and holding water.
Antioxidants
Shields skin from free radical damage.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Redness ReducingSoothes visible redness and calms irritation.
Barrier RepairStrengthen and restore your skin's natural barrier.
Reduces IrritationEases discomfort and supports skin resilience.
Scar HealingImproves the look of marks and scars.
Anti-AgingSoftens lines and helps skin look youthful.
Good For Oily SkinBalances oil and helps reduce shine.
Reduces Large PoresMinimizes the look of enlarged pores.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
PEG/PPG-17/6 Copolymer
Solvent
Low-to-moderate hazard.Read moreShow less
EWG 3 Solvent
Glycereth-26
Humectant, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantViscosity decreasing agentSolventViscosity controlling
Carbomer
Emulsion stabilising, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingViscosity increasing agentGel formingViscosity controlling
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Hydroxyethyl Urea
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningHumectantSkin conditioning
Xanthan Gum
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingSkin conditioningSurfactant -emulsifying agentViscosity increasing agentBindingGel formingViscosity controlling
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Lactobacillus Ferment Lysate
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Disodium Phosphate
Buffering agent, Anticorrosive
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Buffering agentAnticorrosiveFragrancePh adjusterMasking
Sucrose
Flavoring agent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Flavoring agentHumectantSkin conditioningSoothing
Sodium Phosphate
Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Buffering agent
Saccharomyces Ferment Filtrate
Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Humectant
+ 10 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Allantoin
Skin conditioning, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSkin protectingSoothing Good for Oily SkinGood for Sensitive Skin
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Polysorbate 60
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Galactomyces Ferment Filtrate
Humectant
Limited public safety data.Read moreShow less
EWG N/A Humectant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

From the community

0
Reviews
0
Saved by users
0
In collections

Ratings & reviews

Write a Review
0.0
from 0 ratings

Used this product? Rate it in 10 seconds

Alternatives

Where it's from

J
JMsolution
United States · 77 products

More like this

Other products people analyze alongside this one.