Absolut Repair Molecular Professional Rinse-Off Serum

L'Oréal Professionnel

Absolut Repair Molecular Professional Rinse-Off Serum

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About this product

The L'Oréal Professionnel Absolut Repair Molecular Professional Rinse-Off Serum is a misc. Our analysis of its 21 ingredients (18 low-risk) rates it Excellent (96/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
21
Low-risk
18
Fragrance
Contains fragrance
Origin
France

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/7
Good for dry skin
Glutamic Acid Glycerin Propylene Glycol
Caution for dry skin
Glycerin Hydroxypropyl Guar Cetrimonium Chloride Sodium Hydroxide Polysorbate 20 Polysorbate 80 PEG-40 Hydrogenated Castor Oil
Oily/Acne-Prone Skin No data
Sensitive Skin 1/11
Good for sensitive skin
Glycerin
Caution for sensitive skin
Glycine Glutamic Acid Serine Arginine Glycerin Propylene Glycol Tyrosine Citric Acid PEG-40 Hydrogenated Castor Oil Phenoxyethanol Linalool

Ingredients list

21 total
Lower hazard (1) Higher hazard (5)
All21 Fragrance12 Antistatic Agent10 Hair Conditioning9 Skin Conditioning9 Surfactant5 Humectant5 Masking5 Emulsifying4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Glycine
(Buffering Agent, Fragrance, Hair Conditioning, Skin Conditioning Agent Miscellaneous, Antistatic Agent, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
PARFUM
(Fragrance, Perfuming)
3
B
PEG-40 Hydrogenated Castor Oil
(Fragrance, Emulsifying, Surfactant, Perfuming)
Fungal Acne
Fungal Acne Trigger
1
Hydroxypropyltrimonium Hydrolyzed Wheat Protein
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
B
Polysorbate 80
(Denaturant, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
A
Glutamic Acid
(Fragrance, Hair Conditioning, Humectant, Antistatic Agent)
1
Quaternium-80
(Antistatic Agent, Hair Conditioning)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Hydroxypropyl Guar
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Antistatic Agent, Binding, Surfactant, Viscosity Controlling)
1
A
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning)
1
A
Serine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
1
A
Tyrosine
(Fragrance, Hair Conditioning, Proprietary, Skin Conditioning Agent Miscellaneous, Antistatic Agent, Masking, Skin Conditioning)

My Ingredient Notes

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Key ingredients

AHA
Exfoliates skin for a brighter complexion.

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Scar HealingImproves the look of marks and scars.
BrighteningRestores radiance to dull, tired skin.
Reduces IrritationEases discomfort and supports skin resilience.
Barrier RepairStrengthen and restore your skin's natural barrier.

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Glycine
Buffering agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Buffering agentFragranceHair conditioningSkin-conditioning agent -miscellaneousAntistatic agentSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Hydroxypropyltrimonium Hydrolyzed Wheat Protein
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioning
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Glutamic Acid
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningHumectantAntistatic agent
Quaternium-80
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Hydroxypropyl Guar
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentAntistatic agentBindingSurfactantViscosity controlling
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning
Serine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Tyrosine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningProprietarySkin-conditioning agent -miscellaneousAntistatic agentMaskingSkin conditioning
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
PEG-40 Hydrogenated Castor Oil
Fragrance, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceEmulsifyingSurfactantPerfuming Fungal-acne trigger
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Polysorbate 80
Denaturant, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantEmulsifyingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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