Absolut Repair Molecular Rinse-Off Mask

L'Oréal Professionnel

Absolut Repair Molecular Rinse-Off Mask

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About this product

The L'Oréal Professionnel Absolut Repair Molecular Rinse-Off Mask is a misc. Our analysis of its 26 ingredients (21 low-risk) rates it Excellent (95/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
26
Low-risk
21
Fragrance
Contains fragrance
Origin
France

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/7
Good for dry skin
Glutamic Acid Cetearyl Alcohol Glycerin Propylene Glycol Dimethicone
Caution for dry skin
Distarch Phosphate Glycerin Quaternium-87 Trideceth-10 Trideceth-3 PEG-100 Stearate Steareth-6
Oily/Acne-Prone Skin No data
Sensitive Skin 2/12
Good for sensitive skin
Glycerin Dimethicone
Caution for sensitive skin
Glycine Glutamic Acid Serine Acetic Acid Arginine Glycerin Propylene Glycol Tyrosine Citric Acid Isopropyl Alcohol Phenoxyethanol Linalool

Ingredients list

26 total
Lower hazard (1) Higher hazard (5)
All26 Fragrance13 Hair Conditioning9 Skin Conditioning8 Antistatic Agent7 Masking6 Humectant5 Surfactant5 Viscosity Controlling4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
1
Distarch Phosphate
(Anticaking Agent, Binding Agent, Absorbent, Binding)
1
Quaternium-87
(Cleansing, Hair Conditioning, Surfactant)
3
A
Dimethicone
(Antifoaming Agent, Skin Protecting, Emollient, Skin Conditioning)
Silicone
Silicone
3
B
Behentrimonium Chloride
(Antistatic Agent, Hair Conditioning, Preservative)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
PEG-150/Decyl Alcohol/SMDI Copolymer
(Film Forming, Viscosity Controlling)
1
A
Amodimethicone
(Antistatic Agent, Hair Conditioning)
Silicone
Silicone
2
A
Isopropyl Alcohol
(Antifoaming Agent, Fragrance, Solvent, Viscosity Decreasing Agent, Perfuming, Viscosity Controlling)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
B
Trideceth-10
(Emulsifying, Surfactant)
4
B
Chlorhexidine Digluconate
(Cosmetic Biocide, Oral Care Agent, Preservative, Antimicrobial)
3
A
PEG-100 Stearate
(Surfactant)
Fungal Acne
Fungal Acne Trigger
Steareth-6
(Emulsifying, Surfactant)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
1
B
Trideceth-3
(Emulsifying, Surfactant)
1
A
Glycine
(Buffering Agent, Fragrance, Hair Conditioning, Skin Conditioning Agent Miscellaneous, Antistatic Agent, Skin Conditioning)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Serine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Tyrosine
(Fragrance, Hair Conditioning, Proprietary, Skin Conditioning Agent Miscellaneous, Antistatic Agent, Masking, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Glutamic Acid
(Fragrance, Hair Conditioning, Humectant, Antistatic Agent)
1
A
Acetic Acid
(Fragrance, Ph Adjuster, Buffering Agent, Masking)
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

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Key ingredients

Glycerin
Humectant, Skin Protecting
Cetearyl Alcohol
Emollient
Dimethicone
Skin Protecting, Emollient
Propylene Glycol
Humectant, Skin Conditioning
Glycine
Skin Conditioning
Arginine
Skin Conditioning

Benefits

HydratingBoosts hydration and relieves dry, tight skin.
Scar HealingImproves the look of marks and scars.
Reduces IrritationEases discomfort and supports skin resilience.
Barrier RepairStrengthen and restore your skin's natural barrier.

Concerns

Contains paraben
Contains silicone
Contains eu allergen
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
Distarch Phosphate
Anticaking agent, Binding agent
Low-hazard ingredient.Read moreShow less
EWG 1 Anticaking agentBinding agentAbsorbentBinding
Quaternium-87
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CleansingHair conditioningSurfactant
Behentrimonium Chloride
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentHair conditioningPreservative
PEG-150/Decyl Alcohol/SMDI Copolymer
Film forming, Viscosity controlling
Low-to-moderate hazard.Read moreShow less
EWG 3 Film formingViscosity controlling
Trideceth-10
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Chlorhexidine Digluconate
Cosmetic biocide, Oral care agent
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Cosmetic biocideOral care agentPreservativeAntimicrobial
Steareth-6
Emulsifying, Surfactant
Limited public safety data.Read moreShow less
EWG N/A EmulsifyingSurfactant
Trideceth-3
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Glycine
Buffering agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Buffering agentFragranceHair conditioningSkin-conditioning agent -miscellaneousAntistatic agentSkin conditioning
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Serine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Tyrosine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningProprietarySkin-conditioning agent -miscellaneousAntistatic agentMaskingSkin conditioning
Glutamic Acid
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningHumectantAntistatic agent
+ 2 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Dimethicone
Antifoaming agent, Skin protecting
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antifoaming agentSkin protectingEmollientSkin conditioning Silicone
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Amodimethicone
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning Silicone
Isopropyl Alcohol
Antifoaming agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antifoaming agentFragranceSolventViscosity decreasing agentPerfumingViscosity controlling Bad for Sensitive Skin
PEG-100 Stearate
Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Surfactant Fungal-acne trigger
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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