Sensitive Hypoallergenic Shampoo

Live Clean

Sensitive Hypoallergenic Shampoo

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About this product

The Live Clean Sensitive Hypoallergenic Shampoo is a emulsion. Our analysis of its 23 ingredients (20 low-risk) rates it Excellent (96/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
23
Low-risk
20
Fragrance
Fragrance-free
Origin
Canada

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/9
Good for dry skin
Glycol Distearate Glyceryl Stearate Glyceryl Oleate Glycerin Camellia Sinensis Leaf Extract
Caution for dry skin
Glyceryl Oleate Disodium 2-Sulfolaurate Sodium Lauryl Sulfoacetate Sodium Methyl 2-Sulfolaurate Glycerin Coco-glucoside Hydroxypropyl Methylcellulose Camellia Sinensis Leaf Extract Sodium Hydroxide
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 3/9
Good for sensitive skin
Glycerin Camellia Sinensis Leaf Extract Tocopheryl Acetate
Caution for sensitive skin
Glyceryl Oleate Sodium Chloride Glycerin Citric Acid Camellia Sinensis Leaf Extract Benzoic Acid Sodium Benzoate Potassium Sorbate Phenoxyethanol

Ingredients list

23 total
Lower hazard (1) Higher hazard (4)
All23 Skin Conditioning10 Fragrance8 Surfactant6 Masking5 Cleansing4 Emollient4 Preservative4 Viscosity Controlling4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Sodium Lauryl Sulfoacetate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
Sodium Methyl 2-Sulfolaurate
(Cleansing, Foaming, Surfactant)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
CHAMOMILLA RECUTITA FLOWER EXTRACT
(Fragrance, Skin Conditioning)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
Disodium 2-Sulfolaurate
(Cleansing, Surfactant)
1
A
Hydroxypropyl Methylcellulose
(Adhesive, Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Antistatic Agent, Binding, Surfactant, Viscosity Controlling)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Glyceryl Oleate
(Fragrance, Skin Conditioning, Emollient, Emulsifying, Surfactant, Perfuming)
Fungal Acne
Fungal Acne Trigger
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
1
A
Glyceryl Stearate
(Emollient, Emulsifying)
Fungal Acne
Fungal Acne Trigger
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
3
A
Potassium Sorbate
(Fragrance, Preservative)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)

My Ingredient Notes

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
CHAMOMILLA RECUTITA FLOWER EXTRACT
Skin Conditioning
Camellia Sinensis Leaf Extract
Antioxidant, Astringent
Panthenol
Skin Conditioning
Tocopheryl Acetate
Antioxidant, Skin Conditioning
Glycol Distearate
Emollient, Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains paraben
Contains sulfate
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Sodium Methyl 2-Sulfolaurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CleansingFoamingSurfactant
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
CHAMOMILLA RECUTITA FLOWER EXTRACT
Fragrance, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceSkin conditioning
Disodium 2-Sulfolaurate
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CleansingSurfactant
Hydroxypropyl Methylcellulose
Adhesive, Binding agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AdhesiveBinding agentEmulsion stabilisingFilm formingViscosity increasing agentAntistatic agentBindingSurfactantViscosity controlling
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Potassium Sorbate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Sodium Lauryl Sulfoacetate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A CleansingFoamingSurfactant Sulfate
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Glyceryl Oleate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningEmollientEmulsifyingSurfactantPerfuming Fungal-acne trigger
Glyceryl Stearate
Emollient, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientEmulsifying Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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