Styling Mousse

Maria Nila

Where to buy Possibly in stock

About this product

The Maria Nila Styling Mousse is a emulsion. Our analysis of its 23 ingredients (11 low-risk) rates it Great (71/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
23
Low-risk
11
Fragrance
Contains fragrance
Origin
Sweden

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/3
Good for dry skin
Butylene Glycol
Caution for dry skin
Cetrimonium Chloride Polysorbate 20 Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 1/10
Good for sensitive skin
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
Caution for sensitive skin
Butylene Glycol Alcohol Denat. Phenoxyethanol Linalool Citronellol Limonene Benzyl Salicylate Butane Isobutane Hydroxycitronellal

Ingredients list

23 total
Lower hazard (1) Higher hazard (7)
All23 Fragrance7 Masking6 Solvent5 Skin Conditioning5 Deodorant3 Uv Absorber3 Film Forming3 Antistatic Agent3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
4
A
Propane
(Propellant)
7
A
Butane
(Propellant)
3
Butyl Ester of PVM/MA Copolymer
(Antistatic Agent, Binding, Film Forming, Hair Fixing)
7
A
Isobutane
(Propellant)
1
A
Polyquaternium-11
(Antistatic Agent, Film Forming, Hair Fixing)
Helianthus Annuus Seed Extract
(Skin Conditioning)
1
Quaternium-95
(Hair Conditioning, Uv Absorber)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
A
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
(Antioxidant)
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
A
Aminomethyl Propanol
(Ph Adjuster, Buffering Agent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
7
Hydroxycitronellal
(Fragrance, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Alcohol Denat.
Astringent
Helianthus Annuus Seed Extract
Skin Conditioning
Quaternium-95
Uv Absorber
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
Antioxidant
Butylene Glycol
Skin Conditioning, Humectant
Ethylhexylglycerin
Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Butane — higher EWG
Isobutane — higher EWG
Benzyl Salicylate — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Propane
Propellant
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Propellant
Butyl Ester of PVM/MA Copolymer
Antistatic agent, Binding
Low-to-moderate hazard.Read moreShow less
EWG 3 Antistatic agentBindingFilm formingHair fixing
Polyquaternium-11
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Helianthus Annuus Seed Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Quaternium-95
Hair conditioning, Uv absorber
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningUv absorber
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antioxidant
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Aminomethyl Propanol
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Ph adjusterBuffering agent
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Butane
Propellant
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Propellant
Isobutane
Propellant
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Propellant
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Hydroxycitronellal
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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