Cica Houttuynia Tea Tree Calming Mask

Mary & May

Cica Houttuynia Tea Tree Calming Mask

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About this product

The Mary & May Cica Houttuynia Tea Tree Calming Mask is a sheet mask. Our analysis of its 21 ingredients (19 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry and sensitive skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sheet Mask
Ingredients
21
Low-risk
19
Fragrance
Contains fragrance
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 6/5
Good for dry skin
Dipotassium Glycyrrhizate Caprylyl Glycol Butylene Glycol Sodium Hyaluronate Glycerin Polyglyceryl-4 Laurate
Caution for dry skin
Centella Asiatica Extract Caprylyl/Capryl Glucoside Glycerin Polyglyceryl-10 Laurate Polyglyceryl-4 Laurate
Oily/Acne-Prone Skin No data
Sensitive Skin 4/4
Good for sensitive skin
Centella Asiatica Extract Glycerin Hydroxyacetophenone Allantoin
Caution for sensitive skin
Dipropylene Glycol Arginine Butylene Glycol Glycerin

Ingredients list

21 total
Lower hazard (1) Higher hazard (2)
All21 Skin Conditioning18 Humectant6 Solvent5 Fragrance5 Viscosity Controlling5 Emulsion Stabilising4 Hair Conditioning3 Surfactant3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
1
Houttuynia Cordata Extract
(Skin Conditioning)
MELALEUCA ALTERNIFOLIA LEAF EXTRACT
(Perfuming, Skin Conditioning)
1
Hydroxyacetophenone
(Antioxidant)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Carbomer
(Emulsion Stabilising, Viscosity Increasing Agent, Gel Forming, Viscosity Controlling)
1
B
Polyglyceryl-10 Laurate
(Skin Conditioning, Emulsifying, Surfactant)
1
A
1,2-Hexanediol
(Solvent)
1
B
Polyglyceryl-4 Laurate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
1
A
Allantoin
(Skin Conditioning, Skin Protecting, Soothing)
Good for Oily Skin
Good for Oily Skin
Good for Sensitive Skin
Good for Sensitive Skin
1
A
Dipotassium Glycyrrhizate
(Flavoring Agent, Skin Conditioning, Humectant)
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
1
Caprylyl/Capryl Glucoside
(Cleansing, Foaming, Surfactant)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
PARFUM
(Fragrance, Perfuming)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Glycerin
Humectant, Skin Protecting
Centella Asiatica Extract
Skin Conditioning, Soothing
Houttuynia Cordata Extract
Skin Conditioning
MELALEUCA ALTERNIFOLIA LEAF EXTRACT
Skin Conditioning
Hydroxyacetophenone
Antioxidant
Arginine
Skin Conditioning

Benefits

Good for dry skin

Concerns

Not fungal acne (malassezia) safe

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Dipropylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentMaskingViscosity controlling
Centella Asiatica Extract
Cleansing, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSkin conditioningSmoothingSoothingTonic
Houttuynia Cordata Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
MELALEUCA ALTERNIFOLIA LEAF EXTRACT
Perfuming, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A PerfumingSkin conditioning
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Carbomer
Emulsion stabilising, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingViscosity increasing agentGel formingViscosity controlling
Polyglyceryl-10 Laurate
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmulsifyingSurfactant
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Polyglyceryl-4 Laurate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollientEmulsifyingSurfactant
Dipotassium Glycyrrhizate
Flavoring agent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Flavoring agentSkin conditioningHumectant
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Caprylyl/Capryl Glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CleansingFoamingSurfactant
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
+ 2 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Allantoin
Skin conditioning, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSkin protectingSoothing Good for Oily SkinGood for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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