Nourish And Moisture + Coconut Milk Shampoo

Maui Moisture

Nourish And Moisture + Coconut Milk Shampoo

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About this product

The Maui Moisture Nourish And Moisture + Coconut Milk Shampoo is a misc. Our analysis of its 31 ingredients (19 low-risk) rates it Excellent (89/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
31
Low-risk
19
Fragrance
Contains fragrance
Origin
United Kingdom

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/9
Good for dry skin
Glycol Distearate Glycerin
Caution for dry skin
Psidium Guajava Fruit Extract Maltodextrin Glycerin Coco-glucoside PPG-2 Hydroxyethyl Cocamide Hexylene Glycol Sodium C14-16 Olefin Sulfonate Sodium Hydroxide Laureth-4
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Psidium Guajava Fruit Extract
Sensitive Skin 2/11
Good for sensitive skin
Glycerin Aloe Barbadensis Leaf Juice
Caution for sensitive skin
Sodium Citrate Sodium Chloride Glycerin Hexylene Glycol Citric Acid Sodium Benzoate Linalool Hexyl Cinnamal Benzyl Salicylate Coumarin Laureth-4

Ingredients list

31 total
Lower hazard (1) Higher hazard (7)
All31 Skin Conditioning11 Fragrance10 Masking9 Film Forming6 Emulsifying5 Viscosity Controlling5 Viscosity Increasing Agent5 Hair Conditioning5
EWG CIR Ingredient Name & Cosmetic Functions Notes
B
Aloe Barbadensis Leaf Juice
(Skin Conditioning)
Good for Sensitive Skin
Good for Sensitive Skin
1
Water
(Solvent)
2
B
Sodium C14-16 Olefin Sulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
Acrylates Crosspolymer-4
(Emulsion Stabilising, Film Forming, Surfactant Cleansing, Viscosity Controlling)
Cocos Nucifera Fruit Extract
(Hair Conditioning, Skin Conditioning, Skin Conditioning Emollient)
1
Psidium Guajava Fruit Extract
(Astringent, Skin Conditioning)
MANGIFERA INDICA SEED BUTTER
(Skin Conditioning)
Cocos Nucifera Water
(Fragrance)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
2
3
B
Laureth-4
(Antistatic Agent, Emulsifying, Masking, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
3
A
PEG-150 Pentaerythrityl Tetrastearate
(Viscosity Increasing Agent, Emulsifying)
1
PPG-2 Hydroxyethyl Cocamide
(Emulsifying, Surfactant, Foam Boosting, Viscosity Increasing Agent)
1
A
Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning, Viscosity Increasing Agent, Film Forming, Skin Conditioning, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Maltodextrin
(Absorbent, Binding Agent, Emulsion Stabilising, Film Forming, Hair Conditioning, Skin Conditioning, Suspending Agent Nonsurfactant, Binding)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
A
Hexylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Emulsifying, Perfuming, Skin Conditioning, Surfactant)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
Glycine Soja Oil
(Perfuming, Skin Conditioning, Skin Conditioning Emollient)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
1
Leuconostoc/Radish Root Ferment Filtrate
(Antidandruff Agent, Antimicrobial)
PARFUM
(Fragrance, Perfuming)
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
7
Coumarin
(Fragrance, Masking)
Allergens
Allergens

My Ingredient Notes

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Key ingredients

Aloe Barbadensis Leaf Juice
Skin Conditioning
Cocamidopropyl Betaine
Skin Conditioning
Cocos Nucifera Fruit Extract
Skin Conditioning
Psidium Guajava Fruit Extract
Astringent, Skin Conditioning
MANGIFERA INDICA SEED BUTTER
Skin Conditioning
Glycol Distearate
Emollient, Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains sulfate
Contains eu allergen
Not fungal acne (malassezia) safe
Benzyl Salicylate — higher EWG
Coumarin — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
Acrylates Crosspolymer-4
Emulsion stabilising, Film forming
Limited public safety data.Read moreShow less
EWG N/A Emulsion stabilisingFilm formingSurfactant - cleansingViscosity controlling
Cocos Nucifera Fruit Extract
Hair conditioning, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Hair conditioningSkin conditioningSkin conditioning emollient
Psidium Guajava Fruit Extract
Astringent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 AstringentSkin conditioning
MANGIFERA INDICA SEED BUTTER
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Cocos Nucifera Water
Fragrance
Limited public safety data.Read moreShow less
EWG N/A Fragrance
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
PEG-150 Pentaerythrityl Tetrastearate
Viscosity increasing agent, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Viscosity increasing agentEmulsifying
PPG-2 Hydroxyethyl Cocamide
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 EmulsifyingSurfactantFoam boostingViscosity increasing agent
Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningViscosity increasing agentFilm formingSkin conditioningViscosity controlling
Maltodextrin
Absorbent, Binding agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AbsorbentBinding agentEmulsion stabilisingFilm formingHair conditioningSkin conditioningSuspending agent - nonsurfactantBinding
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Hexylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentEmulsifyingPerfumingSkin conditioningSurfactant
+ 6 more — see the full ingredients list above
Aloe Barbadensis Leaf Juice
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A CIR B Skin conditioning Good for Sensitive Skin
Sodium C14-16 Olefin Sulfonate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B CleansingFoamingSurfactant Sulfate
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Laureth-4
Antistatic agent, Emulsifying
Potentially comedogenic - can block poresRead moreShow less
EWG 2–3 CIR B Antistatic agentEmulsifyingMaskingSurfactant Bad for Oily Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Coumarin
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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