My Regeneration Scalp Mask

Molecular Trichology

Where to buy Possibly in stock

About this product

The Molecular Trichology My Regeneration Scalp Mask is a misc. Our analysis of its 20 ingredients (17 low-risk) rates it Excellent (98/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
20
Low-risk
17
Fragrance
Contains fragrance
Origin
Poland

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/7
Good for dry skin
Cetearyl Alcohol Inulin Salvia Hispanica Seed Oil Glycerin Propylene Glycol
Caution for dry skin
Decyl Glucoside Stearamidopropyl Dimethylamine Glycerin Quaternium-87 Ceteareth-20 Cetrimonium Chloride Menthol
Oily/Acne-Prone Skin No data
Sensitive Skin 2/5
Good for sensitive skin
Glycerin Menthol
Caution for sensitive skin
Glycerin Propylene Glycol Citric Acid Menthol Phenoxyethanol

Ingredients list

20 total
Lower hazard (1) Higher hazard (4)
All20 Fragrance7 Hair Conditioning5 Surfactant5 Skin Conditioning5 Humectant5 Preservative4 Antistatic Agent4 Emulsifying4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Inulin
(Humectant, Skin Conditioning)
1
Quaternium-87
(Cleansing, Hair Conditioning, Surfactant)
2
Piroctone Olamine
(Cosmetic Biocide, Preservative)
1
Menthol
(Denaturant, External Analgesic, Flavoring Agent, Fragrance, Oral Health Caredrug, Masking, Refreshing, Soothing)
Good for Oily Skin
Good for Oily Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
Bad for Dry Skin
Bad for Dry Skin
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
Salvia Hispanica Seed Oil
(Moisturising, Skin Conditioning)
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
1
B
Decyl Glucoside
(Cleansing, Emulsion Stabilising, Surfactant)
1
B
Stearamidopropyl Dimethylamine
(Antistatic Agent, Emulsifying, Hair Conditioning, Surfactant)
3
B
Ceteareth-20
(Cleansing, Emulsifying, Surfactant)
3
B
Behentrimonium Chloride
(Antistatic Agent, Hair Conditioning, Preservative)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cetearyl Alcohol
Emollient
Propylene Glycol
Humectant, Skin Conditioning
Glycerin
Humectant, Skin Protecting
Inulin
Humectant, Skin Conditioning
Menthol
Soothing
Panthenol
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Inulin
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A HumectantSkin conditioning
Quaternium-87
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CleansingHair conditioningSurfactant
Piroctone Olamine
Cosmetic biocide, Preservative
Low-hazard ingredient.Read moreShow less
EWG 2 Cosmetic biocidePreservative
Salvia Hispanica Seed Oil
Moisturising, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 MoisturisingSkin conditioning
TOCOPHEROL
Antioxidant, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntioxidantFragranceSkin conditioning
Decyl Glucoside
Cleansing, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingEmulsion stabilisingSurfactant
Stearamidopropyl Dimethylamine
Antistatic agent, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentEmulsifyingHair conditioningSurfactant
Ceteareth-20
Cleansing, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B CleansingEmulsifyingSurfactant
Behentrimonium Chloride
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentHair conditioningPreservative
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Menthol
Denaturant, External analgesic
Potentially a skin irritantRead moreShow less
EWG 1 DenaturantExternal analgesicFlavoring agentFragranceOral health caredrugMaskingRefreshingSoothing Good for Oily SkinBad for Sensitive SkinBad for Dry Skin
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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